›› 2015, Vol. 24 ›› Issue (4): 47701-047701.doi: 10.1088/1674-1056/24/4/047701

• CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES • 上一篇    下一篇

Optimization of TiO2/Cu/TiO2 multilayers as a transparent composite electrode deposited by electron-beam evaporation at room temperature

孙洪涛, 王小平, 寇志起, 王丽军, 王金烨, 孙义清   

  1. College of Science, University of Shanghai for Science and Technology, Shanghai 200093, China
  • 收稿日期:2014-07-27 修回日期:2014-10-28 出版日期:2015-04-05 发布日期:2015-04-05
  • 基金资助:
    Project supported by the Research Innovation Key Project of Education Committee of Shanghai, China (Grant No. 14ZZ137) and the National Cultivation Fund from University of Shanghai for Science and Technology (Grant No. 14XPM04).

Optimization of TiO2/Cu/TiO2 multilayers as a transparent composite electrode deposited by electron-beam evaporation at room temperature

Sun Hong-Tao (孙洪涛), Wang Xiao-Ping (王小平), Kou Zhi-Qi (寇志起), Wang Li-Jun (王丽军), Wang Jin-Ye (王金烨), Sun Yi-Qing (孙义清)   

  1. College of Science, University of Shanghai for Science and Technology, Shanghai 200093, China
  • Received:2014-07-27 Revised:2014-10-28 Online:2015-04-05 Published:2015-04-05
  • Contact: Wang Xiao-Ping E-mail:wxpchina64@aliyun.com,wxpchina@sohu.com
  • Supported by:
    Project supported by the Research Innovation Key Project of Education Committee of Shanghai, China (Grant No. 14ZZ137) and the National Cultivation Fund from University of Shanghai for Science and Technology (Grant No. 14XPM04).

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摘要： Highly transparent indium-free composite electrodes of TiO2/Cu/TiO2 are deposited by electron-beam evaporation at room temperature. The effects of Cu thickness and annealing temperature on the electrical and optical properties of the multilayer film are investigated. The critical thickness of Cu mid-layer to form a continuous conducting layer is found to be 11 nm. The multilayer with a mid-Cu thickness of 11 nm is optimized to obtain a resistivity of 7.4× 10-5 Ω · cm and an average optical transmittance of 86% in the visible spectral range. The figure of merit of the TiO2/Cu(11 nm)/TiO2 multilayer annealed at 150 ℃ reaches a minimum resistivity of 5.9× 10-5Ω · cm and an average optical transmittance of 88% in the visible spectral range. The experimental results indicate that TiO2/Cu/TiO2 multilayers can be used as a transparent electrode for solar cell and other display applications.

关键词: multilayer, transparent conductor, thin film, annealing

Abstract: Highly transparent indium-free composite electrodes of TiO2/Cu/TiO2 are deposited by electron-beam evaporation at room temperature. The effects of Cu thickness and annealing temperature on the electrical and optical properties of the multilayer film are investigated. The critical thickness of Cu mid-layer to form a continuous conducting layer is found to be 11 nm. The multilayer with a mid-Cu thickness of 11 nm is optimized to obtain a resistivity of 7.4× 10-5 Ω · cm and an average optical transmittance of 86% in the visible spectral range. The figure of merit of the TiO2/Cu(11 nm)/TiO2 multilayer annealed at 150 ℃ reaches a minimum resistivity of 5.9× 10-5Ω · cm and an average optical transmittance of 88% in the visible spectral range. The experimental results indicate that TiO2/Cu/TiO2 multilayers can be used as a transparent electrode for solar cell and other display applications.

Key words: multilayer, transparent conductor, thin film, annealing

中图分类号:  (Dielectric thin films)

  • 77.55.-g
68.55.-a (Thin film structure and morphology) 81.15.Hi (Molecular, atomic, ion, and chemical beam epitaxy)