中国物理B ›› 2014, Vol. 23 ›› Issue (4): 48301-048301.doi: 10.1088/1674-1056/23/4/048301
• INTERDISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY • 上一篇 下一篇
闫未霞a b, 王良咏a, 张泽芳a, 刘卫丽a, 宋志棠a
Yan Wei-Xia (闫未霞)a b, Wang Liang-Yong (王良咏)a, Zhang Ze-Fang (张泽芳)a, Liu Wei-Li (刘卫丽)a, Song Zhi-Tang (宋志棠)a
摘要: The effect of iron trichloride (FeCl3) on chemical mechanical polishing (CMP) of Ge2Sb2Te5 (GST) film is investigated in this paper. The polishing rate of GST increases from 38 nm/min to 144 nm/min when the FeCl3 concentration changes from 0.01 wt% to 0.15 wt%, which is much faster than 20 nm/min for the 1 wt% H2O2-based slurry. This polishing rate trends are inversely correlated with the contact angle data of FeCl3-based slurry on the GST film surface. Thus, it is hypothesized that the hydrophilicity of the GST film surface is associated with the polishing rate during CMP. Atomic force microscope (AFM) and optical microscope (OM) are used to characterize the surface quality after CMP. The chemical mechanism is studied by potentiodynamic measurements such as Ecorr and Icorr to analyze chemical reaction between FeCl3 and GST surface. Finally, it is verified that slurry with FeCl3 has no influence on the electrical property of the post-CMP GST film by the resistivity-temperature (RT) tests.
中图分类号: (Extensional flow and combined shear and extension)