中国物理B ›› 2010, Vol. 19 ›› Issue (10): 108102-108102.doi: 10.1088/1674-1056/19/10/108102

• CROSS DISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY • 上一篇    下一篇

Preparation of size controllable copper nanocrystals for nonvolatile memory applications

王利, 孙红芳, 周惠华, 朱静   

  1. Beijing National Center for Electron Microscopy, Department of Materials Science and Engineering, Tsinghua University, Beijing 100084, China
  • 收稿日期:2010-02-23 修回日期:2010-05-19 出版日期:2010-10-15 发布日期:2010-10-15

Preparation of size controllable copper nanocrystals for nonvolatile memory applications

Wang Li(王利), Sun Hong-Fang(孙红芳), Zhou Hui-Hua(周惠华), and Zhu Jing(朱静)   

  1. Beijing National Center for Electron Microscopy, Department of Materials Science and Engineering, Tsinghua University, Beijing 100084, China
  • Received:2010-02-23 Revised:2010-05-19 Online:2010-10-15 Published:2010-10-15

摘要: A method of fabricating Cu nanocrystals embedded in SiO2 dielectric film for nonvolatile memory applications by magnetron sputtering is introduced in this paper. The average size and distribution density of Cu nanocrystal grains are controlled by adjusting experimental parameters. The relationship between nanocrystal floating gate micro-structure and its charge storage capability is also discussed theoretically.

Abstract: A method of fabricating Cu nanocrystals embedded in SiO2 dielectric film for nonvolatile memory applications by magnetron sputtering is introduced in this paper. The average size and distribution density of Cu nanocrystal grains are controlled by adjusting experimental parameters. The relationship between nanocrystal floating gate micro-structure and its charge storage capability is also discussed theoretically.

Key words: nanocrystal grain, nonvolatile memory, Coulomb blockade effect, magnetron sputtering

中图分类号:  (Nanocrystals)

  • 61.46.Hk
81.15.Cd (Deposition by sputtering) 81.16.-c (Methods of micro- and nanofabrication and processing) 84.30.Sk (Pulse and digital circuits)