中国物理B ›› 2007, Vol. 16 ›› Issue (3): 848-853.doi: 10.1088/1009-1963/16/3/049
王金良, 毋二省
Wang Jin-Liang(王金良) and Wu Er-Xing(毋二省)
摘要: The B- and P-doped hydrogenated nanocrystalline silicon films (nc-Si\jz{0.2ex}{:}H) are prepared by plasma-enhanced chemical vapour deposition (PECVD). The microstructures of doped nc-Si\jz{0.2ex}{:}H films are carefully and systematically characterized by using high resolution electron microscopy (HREM), Raman scattering, x-ray diffraction (XRD), Auger electron spectroscopy (AES), and resonant nucleus reaction (RNR). The results show that as the doping concentration of PH3 increases, the average grain size (d) tends to decrease and the crystalline volume percentage (Xc) increases simultaneously. For the B-doped samples, as the doping concentration of B2H\xj{6} increases, no obvious change in the value of d is observed, but the value of Xc is found to decrease. This is especially apparent in the case of heavy B2H2 doped samples, where the films change from nanocrystalline to amorphous.
中图分类号: (Nanocrystals)