Direct growth of graphene films without catalyst on flexible glass substrates by PECVD

doi:10.1088/1674-1056/abeeec

中国物理B ›› 2021, Vol. 30 ›› Issue (9): 98101-098101.doi: 10.1088/1674-1056/abeeec

Direct growth of graphene films without catalyst on flexible glass substrates by PECVD

Rui-Xia Miao(苗瑞霞)^†, Chen-He Zhao(赵晨鹤), Shao-Qing Wang(王少青)^‡, Wei Ren(任卫), Yong-Feng Li(李永锋), Ti-Kang Shu(束体康), and Ben Yang(杨奔)

School of Electronic Engineering, Xi'an University of Posts&Telecommunications, Xi'an 710121, China

收稿日期:2020-12-02 修回日期:2021-03-02 接受日期:2021-03-16 出版日期:2021-08-19 发布日期:2021-09-06
通讯作者: Rui-Xia Miao, Shao-Qing Wang E-mail:miao9508301@xupt.edu.cn;Wsqing1212@163.com
基金资助:
Project supported by the National Natural Science Foundation of China (Grant No. 51302215), the Joint Research Funds of Department of Science & Technology of Shaanxi Province and Northwestern Polytechnical University, China (Grant No. 2020GXLH-Z-029), and the Natural Science Basic Research Program of Shaanxi Province, China (Grant Nos. 2018JQ6084 and 2019JQ-860).

Direct growth of graphene films without catalyst on flexible glass substrates by PECVD

Rui-Xia Miao(苗瑞霞)^†, Chen-He Zhao(赵晨鹤), Shao-Qing Wang(王少青)^‡, Wei Ren(任卫), Yong-Feng Li(李永锋), Ti-Kang Shu(束体康), and Ben Yang(杨奔)

School of Electronic Engineering, Xi'an University of Posts&Telecommunications, Xi'an 710121, China

Received:2020-12-02 Revised:2021-03-02 Accepted:2021-03-16 Online:2021-08-19 Published:2021-09-06
Contact: Rui-Xia Miao, Shao-Qing Wang E-mail:miao9508301@xupt.edu.cn;Wsqing1212@163.com
Supported by:
Project supported by the National Natural Science Foundation of China (Grant No. 51302215), the Joint Research Funds of Department of Science & Technology of Shaanxi Province and Northwestern Polytechnical University, China (Grant No. 2020GXLH-Z-029), and the Natural Science Basic Research Program of Shaanxi Province, China (Grant Nos. 2018JQ6084 and 2019JQ-860).

摘要/Abstract

摘要： A hydrogen-plasma-etching-based plasma-enhanced chemical vapor deposition (PECVD) synthesis route without metal catalyst for preparing the graphene films on flexible glass is developed. The quality of the prepared graphene films is evaluated by scanning electron microscopy, x-ray photoelectron spectroscopy, high-resolution transmission electron microscopy, ultraviolet-visible spectroscopy, and electrochemical measurements. In a radio frequency (RF) power range of 50 W-300 W, the graphene growth rate increases with RF power increasing, while the intensity ratio of D- to G-Raman peak (I_D/I_G) decreases. When the RF power is higher than 300 W, the I_D/I_G rises again. By optimizing experimental parameters of hydrogen plasma etching and RF power, the properties of as-prepared flexible graphene on glass are modulated to be able to achieve the graphene's transparency, good electrical conductivity, and better macroscopic uniformity. Direct growth of graphene film without any metal catalyst on flexible glass can be a promising candidate for applications in flexible transparent optoelectronics.

关键词: graphene, flexible glass, PECVD, RF power

Abstract: A hydrogen-plasma-etching-based plasma-enhanced chemical vapor deposition (PECVD) synthesis route without metal catalyst for preparing the graphene films on flexible glass is developed. The quality of the prepared graphene films is evaluated by scanning electron microscopy, x-ray photoelectron spectroscopy, high-resolution transmission electron microscopy, ultraviolet-visible spectroscopy, and electrochemical measurements. In a radio frequency (RF) power range of 50 W-300 W, the graphene growth rate increases with RF power increasing, while the intensity ratio of D- to G-Raman peak (I_D/I_G) decreases. When the RF power is higher than 300 W, the I_D/I_G rises again. By optimizing experimental parameters of hydrogen plasma etching and RF power, the properties of as-prepared flexible graphene on glass are modulated to be able to achieve the graphene's transparency, good electrical conductivity, and better macroscopic uniformity. Direct growth of graphene film without any metal catalyst on flexible glass can be a promising candidate for applications in flexible transparent optoelectronics.

Key words: graphene, flexible glass, PECVD, RF power

中图分类号: (Graphene)

81.05.ue

81.15.Gh (Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.))

Rui-Xia Miao(苗瑞霞), Chen-He Zhao(赵晨鹤), Shao-Qing Wang(王少青), Wei Ren(任卫), Yong-Feng Li(李永锋), Ti-Kang Shu(束体康), and Ben Yang(杨奔). Direct growth of graphene films without catalyst on flexible glass substrates by PECVD[J]. 中国物理B, 2021, 30(9): 98101-098101.

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Direct growth of graphene films without catalyst on flexible glass substrates by PECVD

Direct growth of graphene films without catalyst on flexible glass substrates by PECVD

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