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Ruo-Han Li(李若晗), Wu-Xiong Fei(费武雄), Rui Tang(唐锐), Zhao-Xi Wu(吴照玺), Chao Duan(段超), Tao Zhang(张涛), Dan Zhu(朱丹), Wei-Hang Zhang(张苇杭), Sheng-Lei Zhao(赵胜雷), Jin-Cheng Zhang(张进成), and Yue Hao(郝跃). Investigation on threshold voltage of p-channel GaN MOSFETs based on p-GaN/AlGaN/GaN heterostructure[J]. 中国物理B, 2021, 30(8): 87305-087305. |
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罗俊, 赵胜雷, 宓珉瀚, 侯斌, 杨晓蕾, 张进成, 马晓华, 郝跃. Trap states induced by reactive ion etching in AlGaN/GaN high-electron-mobility transistors[J]. 中国物理B, 2015, 24(11): 117305-117305. |
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刘建明, 张洁, 林文禹, 叶孟欣, 冯向旭, 张东炎, Steve Ding, 徐宸科, 刘宝林. Effect of pressure on the semipolar GaN (10-11) growth mode on patterned Si substrates[J]. 中国物理B, 2015, 24(5): 57801-057801. |
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