Chin. Phys. B ›› 2012, Vol. 21 ›› Issue (12): 128102-128102.doi: 10.1088/1674-1056/21/12/128102
• INTERDISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY • 上一篇 下一篇
王小平, 刘晓菲, 刘欣欣, 王丽军, 杨灿, 井龙伟, 李松坤, 潘秀芳
Wang Xiao-Ping (王小平), Liu Xiao-Fei (刘晓菲), Liu Xin-Xin (刘欣欣), Wang Li-Jun (王丽军), Yang Can (杨灿), Jing Long-Wei (井龙伟), Li Song-Kun (李松坤), Pan Xiu-Fang (潘秀芳)
摘要: Graphene films are deposited on copper (Cu) and aluminum (Al) substrates, respectively, by using microwave plasma chemical vapour deposition technique. Furthermore, these graphene films are characterized by a field emission type scanning electron microscope (FE-SEM), Raman spectra, and field emission (FE) I-V measurements. It is found that the surface morphologies of the films deposited on Cu and Al substrates are different: the field emission property of graphene film deposited on Cu substrate is better than that on Al substrate, and the lowest turn-on field of 2.4 V/μm is obtained for graphene film deposited on Cu substrate. The macroscopic areas of the graphene samples are all above 400 mm2.
中图分类号: (Graphene)