Field emissions of graphene films deposited on different substrates by CVD system

doi:10.1088/1674-1056/21/12/128102

Chin. Phys. B ›› 2012, Vol. 21 ›› Issue (12): 128102-128102.doi: 10.1088/1674-1056/21/12/128102

• INTERDISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY • 上一篇下一篇

Field emissions of graphene films deposited on different substrates by CVD system

王小平, 刘晓菲, 刘欣欣, 王丽军, 杨灿, 井龙伟, 李松坤, 潘秀芳

College of Science, University of Shanghai for Science and Technology, Shanghai 200093, China

收稿日期:2012-05-13 修回日期:2012-06-18 出版日期:2012-11-01 发布日期:2012-11-01
基金资助:
Project supported by the Shanghai Human Resources and Social Security Bureau, China (Grant No. 2009023).

Field emissions of graphene films deposited on different substrates by CVD system

Wang Xiao-Ping (王小平), Liu Xiao-Fei (刘晓菲), Liu Xin-Xin (刘欣欣), Wang Li-Jun (王丽军), Yang Can (杨灿), Jing Long-Wei (井龙伟), Li Song-Kun (李松坤), Pan Xiu-Fang (潘秀芳)

College of Science, University of Shanghai for Science and Technology, Shanghai 200093, China

Received:2012-05-13 Revised:2012-06-18 Online:2012-11-01 Published:2012-11-01
Contact: Wang Xiao-Ping E-mail:wxpchina64@yahoo.com.cn
Supported by:
Project supported by the Shanghai Human Resources and Social Security Bureau, China (Grant No. 2009023).

摘要/Abstract

摘要： Graphene films are deposited on copper (Cu) and aluminum (Al) substrates, respectively, by using microwave plasma chemical vapour deposition technique. Furthermore, these graphene films are characterized by a field emission type scanning electron microscope (FE-SEM), Raman spectra, and field emission (FE) I-V measurements. It is found that the surface morphologies of the films deposited on Cu and Al substrates are different: the field emission property of graphene film deposited on Cu substrate is better than that on Al substrate, and the lowest turn-on field of 2.4 V/μm is obtained for graphene film deposited on Cu substrate. The macroscopic areas of the graphene samples are all above 400 mm².

关键词: graphene, chemical vapour deposition, field emission

Abstract: Graphene films are deposited on copper (Cu) and aluminum (Al) substrates, respectively, by using microwave plasma chemical vapour deposition technique. Furthermore, these graphene films are characterized by a field emission type scanning electron microscope (FE-SEM), Raman spectra, and field emission (FE) I-V measurements. It is found that the surface morphologies of the films deposited on Cu and Al substrates are different: the field emission property of graphene film deposited on Cu substrate is better than that on Al substrate, and the lowest turn-on field of 2.4 V/μm is obtained for graphene film deposited on Cu substrate. The macroscopic areas of the graphene samples are all above 400 mm².

Key words: graphene, chemical vapour deposition, field emission

中图分类号: (Graphene)

81.05.ue

52.77.-j (Plasma applications) 79.60.Jv (Interfaces; heterostructures; nanostructures) 79.70.+q (Field emission, ionization, evaporation, and desorption)

王小平, 刘晓菲, 刘欣欣, 王丽军, 杨灿, 井龙伟, 李松坤, 潘秀芳. Field emissions of graphene films deposited on different substrates by CVD system[J]. Chin. Phys. B, 2012, 21(12): 128102-128102.

Wang Xiao-Ping (王小平), Liu Xiao-Fei (刘晓菲), Liu Xin-Xin (刘欣欣), Wang Li-Jun (王丽军), Yang Can (杨灿), Jing Long-Wei (井龙伟), Li Song-Kun (李松坤), Pan Xiu-Fang (潘秀芳). Field emissions of graphene films deposited on different substrates by CVD system[J]. Chin. Phys. B, 2012, 21(12): 128102-128102.

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Field emissions of graphene films deposited on different substrates by CVD system

Field emissions of graphene films deposited on different substrates by CVD system

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