中国物理B ›› 2010, Vol. 19 ›› Issue (9): 97807-097807.doi: 10.1088/1674-1056/19/9/097807

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Amorphous Er2O3 films for antireflection coatings

方泽波1, 朱燕艳2, 刘永生2   

  1. (1)Department of Physics, Shaoxing University, Shaoxing 312000, China; (2)Shanghai University of Electric Power, Shanghai 200090, China
  • 收稿日期:2009-11-03 修回日期:2010-02-25 出版日期:2010-09-15 发布日期:2010-09-15
  • 基金资助:
    Project supported by the Special Project of Shanghai Nano-technology (Grant No. 0852nm02400), the National Natural Science Foundation of China (Grant Nos. 10804072 and 60806031), and the Key Fundamental Project of Shanghai (Grant No. 08JC1410400).

Amorphous Er2O3 films for antireflection coatings

Zhu Yan-Yan(朱燕艳)a)†, Fang Ze-Bo(方泽波)b), and Liu Yong-Sheng(刘永生)a)   

  1. a Shanghai University of Electric Power, Shanghai 200090, China; b Department of Physics, Shaoxing University, Shaoxing 312000, China
  • Received:2009-11-03 Revised:2010-02-25 Online:2010-09-15 Published:2010-09-15
  • Supported by:
    Project supported by the Special Project of Shanghai Nano-technology (Grant No. 0852nm02400), the National Natural Science Foundation of China (Grant Nos. 10804072 and 60806031), and the Key Fundamental Project of Shanghai (Grant No. 08JC1410400).

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摘要： This paper reports that stoichiometric, amorphous, and uniform Er2O3 films are deposited on Si(001) substrates by a radio frequency magnetron sputtering technique. Ellipsometry measurements show that the refractive index of the Er2O3 films is very close to that of a single layer antireflection coating for a solar cell with an air surrounding medium during its working wavelength. For the 90-nm-thick film, the reflectance has a minimum lower than 3% at the wavelength of 600 nm and the weighted average reflectances (400--1000 nm) is 11.6%. The obtained characteristics indicate that Er2O3 films could be a promising candidate for antireflection coatings in solar cells.

Abstract: This paper reports that stoichiometric, amorphous, and uniform Er2O3 films are deposited on Si(001) substrates by a radio frequency magnetron sputtering technique. Ellipsometry measurements show that the refractive index of the Er2O3 films is very close to that of a single layer antireflection coating for a solar cell with an air surrounding medium during its working wavelength. For the 90-nm-thick film, the reflectance has a minimum lower than 3% at the wavelength of 600 nm and the weighted average reflectances (400–1000 nm) is 11.6%. The obtained characteristics indicate that Er2O3 films could be a promising candidate for antireflection coatings in solar cells.

Key words: Er2O3 film, optical constants, insulators, solar power

中图分类号: 

  • 7865