中国物理B ›› 2012, Vol. 21 ›› Issue (9): 97304-097304.doi: 10.1088/1674-1056/21/9/097304

• CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES • 上一篇    下一篇

Effect of surface morphology on the electron mobility of epitaxial graphene grown on 0° and 8° Si-terminated 4H-SiC substrates

李佳a, 王丽b, 冯志红a, 蔚翠a, 刘庆彬a, 敦少博a, 蔡树军a   

  1. a Science and Technology on ASIC Lab., Hebei Semiconductor Research Institute, Shijiazhuang 050051, China;
    b Information Center of Science and Technology, Beijing 100040, China
  • 收稿日期:2012-01-30 修回日期:2012-03-19 出版日期:2012-08-01 发布日期:2012-08-01

Effect of surface morphology on the electron mobility of epitaxial graphene grown on 0° and 8° Si-terminated 4H-SiC substrates

Li Jia (李佳)a, Wang Li (王丽)b, Feng Zhi-Hong (冯志红)a, Yu Cui (蔚翠)a, Liu Qing-Bin (刘庆彬)a, Dun Shao-Bo (敦少博)a, Cai Shu-Jun (蔡树军)a   

  1. a Science and Technology on ASIC Lab., Hebei Semiconductor Research Institute, Shijiazhuang 050051, China;
    b Information Center of Science and Technology, Beijing 100040, China
  • Received:2012-01-30 Revised:2012-03-19 Online:2012-08-01 Published:2012-08-01
  • Contact: Feng Zhi-Hong E-mail:blueledviet@yahoo.com.cn

摘要: Graphene with different surface morphologies were fabricated on 8°-off-axis and on-axis 4H-SiC(0001) substrates by high-temperature thermal decomposition. Graphene grown on Si-terminated 8°-off-axis 4H-SiC(0001) shows lower Hall mobility than the counterpart of on-axis SiC substrates. The terrace width is not responsible for different electron mobility of graphene grown on different substrates, as the terrace width is much larger than the mean free path of the electrons. The electron mobility of graphene remains unchanged with increasing terrace width on Si-terminated on-axis SiC. The interface scattering and short-range scattering are the main factors affecting the mobility of epitaxial graphene. After the optimization of the growth process, the Hall mobility of the graphene reaches 1770 cm2/V · s at a carrier density of 9.8.× 1012 cm-2. Wafer-size graphene was successfully achieved with an excellent double-layer thickness uniformity of 89.7% on a 3-inch SiC substrate.

关键词: graphene, morphology, Hall mobility, 3-inch SiC substrate

Abstract: Graphene with different surface morphologies were fabricated on 8°-off-axis and on-axis 4H-SiC(0001) substrates by high-temperature thermal decomposition. Graphene grown on Si-terminated 8°-off-axis 4H-SiC(0001) shows lower Hall mobility than the counterpart of on-axis SiC substrates. The terrace width is not responsible for different electron mobility of graphene grown on different substrates, as the terrace width is much larger than the mean free path of the electrons. The electron mobility of graphene remains unchanged with increasing terrace width on Si-terminated on-axis SiC. The interface scattering and short-range scattering are the main factors affecting the mobility of epitaxial graphene. After the optimization of the growth process, the Hall mobility of the graphene reaches 1770 cm2/V · s at a carrier density of 9.8.× 1012 cm-2. Wafer-size graphene was successfully achieved with an excellent double-layer thickness uniformity of 89.7% on a 3-inch SiC substrate.

Key words: graphene, morphology, Hall mobility, 3-inch SiC substrate

中图分类号:  (Electronic transport in nanoscale materials and structures)

  • 73.63.-b
72.80.Vp (Electronic transport in graphene)