Rear-surface light intensification caused by Hertzian-conical crack in 355-nm silica optics

doi:10.1088/1674-1056/21/9/094213

中国物理B ›› 2012, Vol. 21 ›› Issue (9): 94213-094213.doi: 10.1088/1674-1056/21/9/094213

• ELECTROMAGNETISM, OPTICS, ACOUSTICS, HEAT TRANSFER, CLASSICAL MECHANICS, AND FLUID DYNAMICS • 上一篇下一篇

Rear-surface light intensification caused by Hertzian-conical crack in 355-nm silica optics

章春来^a, 袁晓东^b, 向霞^a, 王治国^a, 刘春明^{a b}, 李莉^a, 贺少勃^{a b}, 祖小涛^a

a School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu 610054, China;
b Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, China

收稿日期:2012-01-01 修回日期:2012-03-17 出版日期:2012-08-01 发布日期:2012-08-01
基金资助:
Project supported by the Young Scientists Fund of the National Natural Science Foundation of China (Grant No. 10904008), the Joint Fund of the National Natural Science Foundation of China and the China Academy of Engineering Physics (Grant No. 11076008), and the Scientific Research Foundation for the Central Universities of China (Grant Nos. ZYGX2009X007, ZYGX2010J045, and ZYGX2011J043).

Rear-surface light intensification caused by Hertzian-conical crack in 355-nm silica optics

Zhang Chun-Lai (章春来)^a, Yuan Xiao-Dong (袁晓东)^b, Xiang Xia (向霞)^a, Wang Zhi-Guo (王治国)^a, Liu Chun-Ming (刘春明)^{a b}, Li Li (李莉)^a, He Shao-Bo (贺少勃)^{a b}, Zu Xiao-Tao (祖小涛)^a

a School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu 610054, China;
b Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, China

Received:2012-01-01 Revised:2012-03-17 Online:2012-08-01 Published:2012-08-01
Contact: Xiang Xia E-mail:xiaxiang@uestc.edu.cn
Supported by:
Project supported by the Young Scientists Fund of the National Natural Science Foundation of China (Grant No. 10904008), the Joint Fund of the National Natural Science Foundation of China and the China Academy of Engineering Physics (Grant No. 11076008), and the Scientific Research Foundation for the Central Universities of China (Grant Nos. ZYGX2009X007, ZYGX2010J045, and ZYGX2011J043).

摘要/Abstract

摘要： Theoretical studies show that the Hertzian-conical crack can be considered to be composed of double cone faces for simplification. In the present study, the three-dimensional finite-difference time-domain method is employed to quantify the electric-field distribution within the subsurface in the presence of such a defect under the normal incidence irradiation. Both impurities (inside the crack) and the chemical etching have been investigated. The results show that the maximum electric field amplitude |E| _max is 9.57374 V/m when the relative dielectric constant of transparent impurity equals 8.5. And the near-field modulation will be improved if the crack filled with remainder polishing powders or water vapor/drops. Meanwhile, the laser-induced initial damage is moving to the glass-air surface. In the etched section, the magnitude of intensification is strongly dependent on the inclination angle θ. There will be a highest modulation when θ is around π /6, and the maximum value of |E| _max is 18.57314 V/m. When θ ranges from π /8 to π /4, the light intensity enhancement factor can easily be larger than 100, and the modulation follows a decreasing trend. On the other hand, the modulation curves become smooth when θ > π /4 or θ < π /8.

关键词: fused silica, wet etching, Hertzian-conical crack, finite-difference time-domain method

Abstract: Theoretical studies show that the Hertzian-conical crack can be considered to be composed of double cone faces for simplification. In the present study, the three-dimensional finite-difference time-domain method is employed to quantify the electric-field distribution within the subsurface in the presence of such a defect under the normal incidence irradiation. Both impurities (inside the crack) and the chemical etching have been investigated. The results show that the maximum electric field amplitude |E| _max is 9.57374 V/m when the relative dielectric constant of transparent impurity equals 8.5. And the near-field modulation will be improved if the crack filled with remainder polishing powders or water vapor/drops. Meanwhile, the laser-induced initial damage is moving to the glass-air surface. In the etched section, the magnitude of intensification is strongly dependent on the inclination angle θ. There will be a highest modulation when θ is around π /6, and the maximum value of |E| _max is 18.57314 V/m. When θ ranges from π /8 to π /4, the light intensity enhancement factor can easily be larger than 100, and the modulation follows a decreasing trend. On the other hand, the modulation curves become smooth when θ > π /4 or θ < π /8.

Key words: fused silica, wet etching, Hertzian-conical crack, finite-difference time-domain method

中图分类号: (Beam characteristics: profile, intensity, and power; spatial pattern formation)

42.60.Jf

42.62.-b (Laser applications) 42.70.Ce (Glasses, quartz) 52.57.-z (Laser inertial confinement)

章春来, 袁晓东, 向霞, 王治国, 刘春明, 李莉, 贺少勃, 祖小涛. Rear-surface light intensification caused by Hertzian-conical crack in 355-nm silica optics[J]. 中国物理B, 2012, 21(9): 94213-094213.

Zhang Chun-Lai (章春来), Yuan Xiao-Dong (袁晓东), Xiang Xia (向霞), Wang Zhi-Guo (王治国), Liu Chun-Ming (刘春明), Li Li (李莉), He Shao-Bo (贺少勃), Zu Xiao-Tao (祖小涛). Rear-surface light intensification caused by Hertzian-conical crack in 355-nm silica optics[J]. Chin. Phys. B, 2012, 21(9): 94213-094213.

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Rear-surface light intensification caused by Hertzian-conical crack in 355-nm silica optics

Rear-surface light intensification caused by Hertzian-conical crack in 355-nm silica optics

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