中国物理B ›› 2009, Vol. 18 ›› Issue (4): 1679-1683.doi: 10.1088/1674-1056/18/4/067

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A comparative study of YBa2Cu3O7-δ/YSZ bilayer films deposited on silicon-on-insulator substrates with and without HF pretreatment

李洁1, 陈莺飞1, 李绍1, 王佳1, 郑东宁1, 解廷月2, 王萍3   

  1. (1)National Laboratory for Superconductivity, Institute of Physics {& Beijing National Laboratory for Condensed Matter Physics, Chinese Academy of Sciences, Beijing 100190, China; (2)School of Physics and Electronics Science, Shanxi Datong University, Datong 037009, China; (3)School of Physics and Electronics Science, Shanxi Datong University, Datong 037009, China;National Laboratory for Superconductivity, Institute of Physics {& Beijing National Laboratory for Condensed Matter Physics, Chinese Academy of Sciences, Beijing 100
  • 收稿日期:2008-11-24 修回日期:2008-12-18 出版日期:2009-04-20 发布日期:2009-04-20
  • 基金资助:
    Project supported by the National Natural Science Foundation of China (Grant Nos 50672125 and 10574154), the Natural Science Foundation of Shanxi Province, China (Grant No 2009011003-1), and the Youth Foundation of Shanxi Datong University, China (Grant N

A comparative study of YBa2Cu3O7-$\delta$/YSZ bilayer films deposited on silicon-on-insulator substrates with and without HF pretreatment

Wang Ping(王萍)a)b), Li Jie(李洁)b), Chen Ying-Fei(陈莺飞)b), Li Shao(李绍)b), Wang Jia(王佳)b), Xie Ting-Yue(解廷月)a), and Zheng Dong-Ning(郑东宁)b)   

  1. a School of Physics and Electronics Science, Shanxi Datong University, Datong 037009, China; b National Laboratory for Superconductivity, Institute of Physics & Beijing National Laboratory for Condensed Matter Physics, Chinese Academy of Sciences, Beijing 100190, China
  • Received:2008-11-24 Revised:2008-12-18 Online:2009-04-20 Published:2009-04-20
  • Supported by:
    Project supported by the National Natural Science Foundation of China (Grant Nos 50672125 and 10574154), the Natural Science Foundation of Shanxi Province, China (Grant No 2009011003-1), and the Youth Foundation of Shanxi Datong University, China (Grant N

摘要: Highly epitaxial YBa2Cu3O7 - δ (YBCO) and yttria-stabilized zirconia (YSZ) bilayer thin films have been deposited on silicon-on-insulator (SOI) substrates by using in situ pulsed laser deposition (PLD) technique. In the experiment, the native amorphous SiO2 layers on some of the SOI substrates are removed by dipping them in a 10% HF solution for 15 s. Comparing several qualities of films grown on substrates with or without HF pretreatment, such as thin film crystallinity, general surface roughness, temperature dependence of resistance, surface morphology, as well as average crack spacing and crack width, naturally leads to the conclusion that preserving the native SiO2 layer on the surface of the SOI substrate can not only simplify the experimental process but can also achieve fairly high quality YSZ and YBCO thin films.

关键词: pulsed laser deposition, thin film, pretreatment, SOI substrate

Abstract: Highly epitaxial YBa2Cu3O7-$\delta$  (YBCO) and yttria-stabilized zirconia (YSZ) bilayer thin films have been deposited on silicon-on-insulator (SOI) substrates by using in situ pulsed laser deposition (PLD) technique. In the experiment, the native amorphous SiO2 layers on some of the SOI substrates are removed by dipping them in a 10% HF solution for 15 s. Comparing several qualities of films grown on substrates with or without HF pretreatment, such as thin film crystallinity, general surface roughness, temperature dependence of resistance, surface morphology, as well as average crack spacing and crack width, naturally leads to the conclusion that preserving the native SiO2 layer on the surface of the SOI substrate can not only simplify the experimental process but can also achieve fairly high quality YSZ and YBCO thin films.

Key words: pulsed laser deposition, thin film, pretreatment, SOI substrate

中图分类号: 

  • 74.78.Bz
81.15.Fg (Pulsed laser ablation deposition) 74.25.Ld (Mechanical and acoustical properties, elasticity, and ultrasonic Attenuation) 68.37.Hk (Scanning electron microscopy (SEM) (including EBIC)) 61.05.jh (Low-energy electron diffraction (LEED) and reflection high-energy electron diffraction (RHEED))