中国物理B ›› 2006, Vol. 15 ›› Issue (2): 389-393.doi: 10.1088/1009-1963/15/2/026
黄伟其1, 刘世荣2
Huang Wei-Qi (黄伟其)acd, Liu Shi-Rong (刘世荣)b
摘要: The investigation on the oxidation behaviour of Si$_{1-x}$Ge$_{x}$ alloys ($x$=0.05, 0.15, and 0.25) is carried out. It is found for the first time that on the oxide film a germanium nano-cap with a thickness of 1.8--2.8nm and a few Ge nanoparticles with diameters ranging from 5.5 nm to 10 nm are formed by the low-temperature laser-assisted dry oxidation of Si$_{1 - x}$Ge$_{x}$ substrate. A new scanning method on the decline cross-section of the multiple-layer sample is adopted to measure the layer thickness and the composition. Some new peaks in photoluminescence (PL) spectra are discovered, which could be related to the nano-cap and the nano-particles of germanium. A suitable model and several new calculating formulae with the unrestricted Hartree--Fock--Roothaan (UHFR) method and quantum confinement analysis are proposed to interpret the PL spectra and the nano-structure mechanism in the oxide.
中图分类号: (Oxidation)