中国物理B ›› 2005, Vol. 14 ›› Issue (1): 154-158.doi: 10.1088/1009-1963/14/1/028

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Numerical simulation of chemical processes in helium plasmas in atmosphere environment

郭伟1, 王龙1, 邵福球2, 欧阳建明3   

  1. (1)Institute of Physics, Chinese Academy of Sciences, Beijing,100080, China; (2)National University of Defence Science and Technology,Changsha,410073, China; (3)National University of Defence Science and Technology,Changsha,410073, China;Institute of Physics, Chinese Academy of Sciences, Beijing,100080, China
  • 收稿日期:2004-06-04 修回日期:2004-08-30 出版日期:2005-01-20 发布日期:2005-01-20

Numerical simulation of chemical processes in helium plasmas in atmosphere environment

Ouyang Jian-Ming (欧阳建明)ab, Guo Wei (郭伟)b, Wang Long (王龙)b, Shao Fu-Qiu (邵福球)a   

  1. a National University of Defence Science and Technology, Changsha 410073, China; b Institute of Physics, Chinese Academy of Sciences, Beijing 100080, China
  • Received:2004-06-04 Revised:2004-08-30 Online:2005-01-20 Published:2005-01-20

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摘要： A model is built to study chemical processes in plasmas generated in helium with trace amounts of air at atmospheric pressure or low pressures. The plasma lifetimes and the temporal evolutions of the main charged species are presented. The plasma lifetimes are longer than that in air plasma at atmospheric pressure, but this is not true at low pressures. The electron number density does not strictly obey the exponential damping law in a longer period.

关键词: helium plasma, chemical processes, lifetime

Abstract: A model is built to study chemical processes in plasmas generated in helium with trace amounts of air at atmospheric pressure or low pressures. The plasma lifetimes and the temporal evolutions of the main charged species are presented. The plasma lifetimes are longer than that in air plasma at atmospheric pressure, but this is not true at low pressures. The electron number density does not strictly obey the exponential damping law in a longer period.

Key words: helium plasma, chemical processes, lifetime

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  • 5220