中国物理B ›› 2025, Vol. 34 ›› Issue (5): 54206-054206.doi: 10.1088/1674-1056/adbbbf
Experimental demonstration of silicon nitride waveguide gratings with excellent efficiency and divergence angle
Zhaozhen Chen(陈兆震)1,2, Wenling Li(李文玲)3, Qian Wang(王乾)4, Enfeng Liu(刘恩峰)4, Xinqun Zhang(张新群)3, Jingwei Liu(刘敬伟)3,†, and Zhengsheng Han(韩郑生)1,2,‡
- 1 Institute of Microelectronics of the Chinese Academy of Sciences, Beijing 100029, China;
2 University of Chinese Academy of Sciences, Beijing 100049, China;
3 China Science Photon Chip (Haining) Technology Co., Ltd., Haining 314499, China;
4 Beijing YanDong MicroElectronic Technology Co., Ltd., Beijing 100006, China
Experimental demonstration of silicon nitride waveguide gratings with excellent efficiency and divergence angle
Zhaozhen Chen(陈兆震)1,2, Wenling Li(李文玲)3, Qian Wang(王乾)4, Enfeng Liu(刘恩峰)4, Xinqun Zhang(张新群)3, Jingwei Liu(刘敬伟)3,†, and Zhengsheng Han(韩郑生)1,2,‡
- 1 Institute of Microelectronics of the Chinese Academy of Sciences, Beijing 100029, China;
2 University of Chinese Academy of Sciences, Beijing 100049, China;
3 China Science Photon Chip (Haining) Technology Co., Ltd., Haining 314499, China;
4 Beijing YanDong MicroElectronic Technology Co., Ltd., Beijing 100006, China
摘要： Silicon nitride (Si$_3$N$_4$) photonic platform has recently attracted increasing attention for Si$_3$N$_4$ photonic integrated circuits $(\rm PIC)$. A diffraction grating with the only etched top-layer in tri-layer Si$_3$N$_4$ optical waveguides is proposed, which shows a simple fabrication process, high upward diffraction efficiency, and lower far-field divergence angle. The measured results of the diffraction grating at a wavelength of 905 nm show the average upward diffraction efficiency of 90.5% and average far-field divergence angle of 0.154$^\circ$, which shows a good agreement with the design results with the upward diffraction efficiency of 91.6% and far-field divergence angle of 0.105$^\circ$.
中图分类号: (Optical elements, devices, and systems)
- 42.79.-e