中国物理B ›› 2021, Vol. 30 ›› Issue (7): 78501-078501.doi: 10.1088/1674-1056/abe2fe

• • 上一篇    下一篇

Trigger mechanism of PDSOI NMOS devices for ESD protection operating under elevated temperatures

Jia-Xin Wang(王加鑫)1,2,3, Xiao-Jing Li(李晓静)1,2,†, Fa-Zhan Zhao(赵发展)1,2,‡, Chuan-Bin Zeng(曾传滨)1,2, Duo-Li Li(李多力)1,2, Lin-Chun Gao(高林春)1,2, Jiang-Jiang Li(李江江)1,2, Bo Li(李博)1,2, Zheng-Sheng Han(韩郑生)1,2,3, and Jia-Jun Luo(罗家俊)1,2   

  1. 1 Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China;
    2 Key Laboratory of Science and Technology on Silicon Devices, Chinese Academy of Sciences, Beijing 100029, China;
    3 University of Chinese Academy of Sciences, Beijing 100029, China
  • 收稿日期:2020-11-09 修回日期:2021-01-04 接受日期:2021-02-04 出版日期:2021-06-22 发布日期:2021-07-09
  • 通讯作者: Xiao-Jing Li, Fa-Zhan Zhao E-mail:lixiaojing1@ime.ac.cn;zhaofazhan@ime.ac.cn
  • 基金资助:
    Project supported by the National Natural Science Foundation of China (Grant No. 61804168).

Trigger mechanism of PDSOI NMOS devices for ESD protection operating under elevated temperatures

Jia-Xin Wang(王加鑫)1,2,3, Xiao-Jing Li(李晓静)1,2,†, Fa-Zhan Zhao(赵发展)1,2,‡, Chuan-Bin Zeng(曾传滨)1,2, Duo-Li Li(李多力)1,2, Lin-Chun Gao(高林春)1,2, Jiang-Jiang Li(李江江)1,2, Bo Li(李博)1,2, Zheng-Sheng Han(韩郑生)1,2,3, and Jia-Jun Luo(罗家俊)1,2   

  1. 1 Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China;
    2 Key Laboratory of Science and Technology on Silicon Devices, Chinese Academy of Sciences, Beijing 100029, China;
    3 University of Chinese Academy of Sciences, Beijing 100029, China
  • Received:2020-11-09 Revised:2021-01-04 Accepted:2021-02-04 Online:2021-06-22 Published:2021-07-09
  • Contact: Xiao-Jing Li, Fa-Zhan Zhao E-mail:lixiaojing1@ime.ac.cn;zhaofazhan@ime.ac.cn
  • Supported by:
    Project supported by the National Natural Science Foundation of China (Grant No. 61804168).

摘要: Trigger characteristics of electrostatic discharge (ESD) protecting devices operating under various ambient temperatures ranging from 30 ℃ to 195 ℃ are investigated. The studied ESD protecting devices are the H-gate NMOS transistors fabricated with a 0.18-μm partially depleted silicon-on-insulator (PDSOI) technology. The measurements are conducted by using a transmission line pulse (TLP) test system. The different temperature-dependent trigger characteristics of grounded-gate (GGNMOS) mode and the gate-triggered (GTNMOS) mode are analyzed in detail. The underlying physical mechanisms related to the effect of temperature on the first breakdown voltage VT1 are investigated through the assist of technology computer-aided design (TCAD) simulation.

关键词: ESD, trigger voltage, temperature, GGNMOS, GTNMOS, TCAD

Abstract: Trigger characteristics of electrostatic discharge (ESD) protecting devices operating under various ambient temperatures ranging from 30 ℃ to 195 ℃ are investigated. The studied ESD protecting devices are the H-gate NMOS transistors fabricated with a 0.18-μm partially depleted silicon-on-insulator (PDSOI) technology. The measurements are conducted by using a transmission line pulse (TLP) test system. The different temperature-dependent trigger characteristics of grounded-gate (GGNMOS) mode and the gate-triggered (GTNMOS) mode are analyzed in detail. The underlying physical mechanisms related to the effect of temperature on the first breakdown voltage VT1 are investigated through the assist of technology computer-aided design (TCAD) simulation.

Key words: ESD, trigger voltage, temperature, GGNMOS, GTNMOS, TCAD

中图分类号:  (Semiconductor-device characterization, design, and modeling)

  • 85.30.De
41.20.Cv (Electrostatics; Poisson and Laplace equations, boundary-value problems) 85.30.Mn (Junction breakdown and tunneling devices (including resonance tunneling devices))