中国物理B ›› 2020, Vol. 29 ›› Issue (9): 98502-098502.doi: 10.1088/1674-1056/ab9de6
Wenqiang Song(宋文强), Fei Hou(侯飞), Feibo Du(杜飞波), Zhiwei Liu(刘志伟), Juin J. Liou(刘俊杰)
Wenqiang Song(宋文强)1, Fei Hou(侯飞)1, Feibo Du(杜飞波)1, Zhiwei Liu(刘志伟)1, Juin J. Liou(刘俊杰)2
摘要: A robust electron device called the enhanced gated-diode-triggered silicon-controlled rectifier (EGDTSCR) for electrostatic discharge (ESD) protection applications has been proposed and implemented in a 0.18-μm 5-V/24-V BCD process. The proposed EGDTSCR is constructed by adding two gated diodes into a conventional ESD device called the modified lateral silicon-controlled rectifier (MLSCR). With the shunting effect of the surface gated diode path, the proposed EGDTSCR, with a width of 50 μm, exhibits a higher failure current (i.e., 3.82 A) as well as a higher holding voltage (i.e., 10.21 V) than the MLSCR.
中图分类号: (Semiconductor-device characterization, design, and modeling)