[1] |
Kim M H, Schubert M F, Dai Q, Kim J K, Schuberta E F, Piprek J and Park Y 2007 Appl. Phys. Lett. 91 183507
doi: 10.1063/1.2800290
|
[2] |
Steigerwald D A, Bhat J C, Collins D, Fletcher R M, Holcomb M O, Ludowise M J, Martin P S and Rudaz S L 2002 IEEE J. Sel. Top. Quantum Electron. 8 310
doi: 10.1109/2944.999186
|
[3] |
Shen L, Heikman S, Moran B, Coffie R, Zhang N Q, Buttari D, Smorchkova I P, Keller S, DenBaars S P and Mishra U K 2001 IEEE Electron Device Lett. 22 457
doi: 10.1109/55.954910
|
[4] |
Zhang Y H, Dadgar A and Palacios T 2018 J. Phys. D: Appl. Phys. 51 273001
doi: 10.1088/1361-6463/aac8aa
|
[5] |
Liu L and Edgar J H 2002 Mater. Sci. Eng. R-Rep. 37 61
doi: 10.1016/S0927-796X(02)00008-6
|
[6] |
Kelly M K, Ambacher O, Dimitrov R, Handschuh R and Stutzmann M 1997 Phys. Status Solidi A 159 R3
|
[7] |
Wong W S, Sands T, Cheung N W, Kneissl M, Bour D P, Mei P, Romano L T and Johnson N M 1999 Appl. Phys. Lett. 75 1360
doi: 10.1063/1.124693
|
[8] |
Monemar B, Larsson H, Hemmingsson C, Ivanov I G and Gogova D 2005 J. Cryst. Growth 281 17
doi: 10.1016/j.jcrysgro.2005.03.040
|
[9] |
Tong X L, Li L, Zhang D S, Dai Y T, Lv D J, Ling K, Liu Z X, Lu P X, Yang G, Yang Z Y and Long H 2009 J. Phys. D-Appl. Phys. 42 045414
doi: 10.1088/0022-3727/42/4/045414
|
[10] |
Lipski F, Wunderer T, Schwaiger S and Scholz F 2010 Phys. Status Solidi A 207 1287
doi: 10.1002/pssa.200983517
|
[11] |
Hartono H, Soh C B, Chow S Y, Chua S J and Fitzgerald E A 2007 Appl. Phys. Lett. 90 171917
doi: 10.1063/1.2732826
|
[12] |
Jang L W, Jeon D W, Polyakov A Y, Govorkov A V, Sokolov V N, Smirnov N B, Cho H S, Yun J H, Shcherbatchev K D, Baek J H and Lee I H 2014 J. Alloy. Compd. 589 507
doi: 10.1016/j.jallcom.2013.12.034
|
[13] |
Zhang L, Dai Y B, Wu Y Z, Shao Y L, Tian Y, Huo Q, Hao X P, Shen Y N and Hua Z 2014 Crystengcomm 16 9063
doi: 10.1039/C4CE01188K
|
[14] |
Li Y W, Xiu X Q Xiong Z N, Hua X M, Xie Z L, Tao T, Chen P, Liu B, Zhang R and Zheng Y D 2019 Mater. Lett. 240 121
doi: 10.1016/j.matlet.2018.12.120
|
[15] |
Xiong Z N, Xiu X Q, Li Y W, Hua X M, Xie Z L, Chen P, Liu B, Han P, Zhang R and Zheng Y D 2018 Chin. Phys. Lett. 35 58101
doi: 10.1088/0256-307X/35/5/058101
|
[16] |
Li Y W, Xiu X Q, Xiong Z N, Hua X M, Xie Z L, Chen P, Liu B, Tao T, Zhang R and Zheng Y D 2019 Crystengcomm 21 1224
doi: 10.1039/C8CE01336E
|
[17] |
Melnik Y V, Vassilevski K V, Nikitina I P, Babanin A I, Davydov V Y and Dmitriev V A 1997 MRS Int. J. Nitride Semicond. Res. 2 e39
|
[18] |
Tripathy S, Chua S J, Chen P and Miao Z L 2002 J. Appl. Phys. 92 3503
doi: 10.1063/1.1502921
|
[19] |
Kushvaha S S, Kumar M S, Shukla A K, Yadav B S, Singh D K, Jewariya M, Ragam S R and Maurya K K 2015 RSC Adv. 5 87818
doi: 10.1039/C5RA11361J
|
[20] |
Zhao D G, Xu S J, Xie M H, Tong S Y and Yang H 2003 Appl. Phys. Lett. 83 677
doi: 10.1063/1.1592306
|
[21] |
Vajpeyi A P, Tripathy S, Chua S J and Fitzgerald E A 2005 Physica E 28 141
doi: 10.1016/j.physe.2005.03.007
|
[22] |
Ng H M, Doppalapudi D, Moustakas T D, Weimann N G and Eastman L F 1998 Appl. Phys. Lett. 73 821
doi: 10.1063/1.122012
|