中国物理B ›› 2016, Vol. 25 ›› Issue (12): 128101-128101.doi: 10.1088/1674-1056/25/12/128101
• INTERDISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY • 上一篇 下一篇
Shi-Yan Li(李士颜), Xu-Liang Zhou(周旭亮), Xiang-Ting Kong(孔祥挺), Meng-Ke Li(李梦珂), Jun-Ping Mi(米俊萍), Meng-Qi Wang(王梦琦), Jiao-Qing Pan(潘教青)
Shi-Yan Li(李士颜), Xu-Liang Zhou(周旭亮), Xiang-Ting Kong(孔祥挺), Meng-Ke Li(李梦珂), Jun-Ping Mi(米俊萍), Meng-Qi Wang(王梦琦), Jiao-Qing Pan(潘教青)
摘要:
This letter reports the nanoscale spatial phase modulation of GaAs growth in V-grooved trenches fabricated on a Si (001) substrate by metal-organic vapor-phase epitaxy. Two hexagonal GaAs regions with high density of stacking faults parallel to Si {111} surfaces are observed. A strain-relieved and defect-free cubic phase GaAs was achieved above these highly defective regions. High-resolution transmission electron microscopy and fast Fourier transforms analysis were performed to characterize these regions of GaAs/Si interface. We also discussed the strain relaxation mechanism and phase structure modulation of GaAs selectively grown on this artificially manipulated surface.
中图分类号: (III-V semiconductors)