Plasma induced by pulsed laser and fabrication of silicon nanostructures

doi:10.1088/1674-1056/24/8/084205

中国物理B ›› 2015, Vol. 24 ›› Issue (8): 84205-084205.doi: 10.1088/1674-1056/24/8/084205

• ELECTROMAGNETISM, OPTICS, ACOUSTICS, HEAT TRANSFER, CLASSICAL MECHANICS, AND FLUID DYNAMICS • 上一篇下一篇

Plasma induced by pulsed laser and fabrication of silicon nanostructures

黄伟其^a, 董泰阁^b, 王刚^b, 刘世荣^b, 黄忠梅^a, 苗信建^a, 吕泉^c, 秦朝建^b

a Institute of Nanophotonic Physics, Key Laboratory of Photoelectron Technology and Application, Guizhou University, Guiyang 550025, China;
b State Key Laboratory of Ore Deposit Geochemistry, Institute of Geochemistry, Chinese Academy of Sciences, Guiyang 550003, China;
c Surface Physics Laboratory, Department of Physics, Fudan University, Shanghai 200433, China

收稿日期:2014-11-18 修回日期:2015-02-06 出版日期:2015-08-05 发布日期:2015-08-05
基金资助:
Project supported by the National Natural Science Foundation of China (Grant Nos. 11264007 and 61465003).

Plasma induced by pulsed laser and fabrication of silicon nanostructures

Hang Wei-Qi (黄伟其)^a, Dong Tai-Ge (董泰阁)^b, Wang Gang (王刚)^b, Liu Shi-Rong (刘世荣)^b, Huang Zhong-Mei (黄忠梅)^a, Miao Xin-Jian (苗信建)^a, Lv Quan (吕泉)^c, Qin Chao-Jian (秦朝建)^b

a Institute of Nanophotonic Physics, Key Laboratory of Photoelectron Technology and Application, Guizhou University, Guiyang 550025, China;
b State Key Laboratory of Ore Deposit Geochemistry, Institute of Geochemistry, Chinese Academy of Sciences, Guiyang 550003, China;
c Surface Physics Laboratory, Department of Physics, Fudan University, Shanghai 200433, China

Received:2014-11-18 Revised:2015-02-06 Online:2015-08-05 Published:2015-08-05
Contact: Hang Wei-Qi E-mail:sci.wqhuang@gzu.edu.cn
Supported by:
Project supported by the National Natural Science Foundation of China (Grant Nos. 11264007 and 61465003).

摘要/Abstract

摘要： It is interesting that in preparing process of nanosilicon by pulsed laser, the periodic diffraction pattern from plasmonic lattice structure in the Purcell cavity due to interaction between plasmons and photons is observed. This kind of plasmonic lattice structure confined in the cavity may be similar to the Wigner crystal structure. Emission manipulation on Si nanostructures fabricated by the plasmonic wave induced from pulsed laser is studied by using photoluminescence spectroscopy. The electronic localized states and surface bonding are characterized by several emission bands peaked near 600 nm and 700 nm on samples prepared in oxygen or nitrogen environment. The electroluminescence wavelength is measured in the telecom window on silicon film coated by ytterbium. The enhanced emission originates from surface localized states in band gap due to broken symmetry from some bonds on surface bulges produced by plasmonic wave in the cavity.

关键词: nanosilicon, pulsed laser, plasmon, photon

Abstract: It is interesting that in preparing process of nanosilicon by pulsed laser, the periodic diffraction pattern from plasmonic lattice structure in the Purcell cavity due to interaction between plasmons and photons is observed. This kind of plasmonic lattice structure confined in the cavity may be similar to the Wigner crystal structure. Emission manipulation on Si nanostructures fabricated by the plasmonic wave induced from pulsed laser is studied by using photoluminescence spectroscopy. The electronic localized states and surface bonding are characterized by several emission bands peaked near 600 nm and 700 nm on samples prepared in oxygen or nitrogen environment. The electroluminescence wavelength is measured in the telecom window on silicon film coated by ytterbium. The enhanced emission originates from surface localized states in band gap due to broken symmetry from some bonds on surface bulges produced by plasmonic wave in the cavity.

Key words: nanosilicon, pulsed laser, plasmon, photon

中图分类号: (Lasers)

42.55.-f

68.65.Hb (Quantum dots (patterned in quantum wells)) 78.45.+h (Stimulated emission)

黄伟其, 董泰阁, 王刚, 刘世荣, 黄忠梅, 苗信建, 吕泉, 秦朝建. Plasma induced by pulsed laser and fabrication of silicon nanostructures[J]. 中国物理B, 2015, 24(8): 84205-084205.

Hang Wei-Qi (黄伟其), Dong Tai-Ge (董泰阁), Wang Gang (王刚), Liu Shi-Rong (刘世荣), Huang Zhong-Mei (黄忠梅), Miao Xin-Jian (苗信建), Lv Quan (吕泉), Qin Chao-Jian (秦朝建). Plasma induced by pulsed laser and fabrication of silicon nanostructures[J]. Chin. Phys. B, 2015, 24(8): 84205-084205.

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Plasma induced by pulsed laser and fabrication of silicon nanostructures

Plasma induced by pulsed laser and fabrication of silicon nanostructures

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