Enhanced surface plasmon interference lithography from cavity resonance in the grating slits

doi:10.1088/1674-1056/24/4/047301

›› 2015, Vol. 24 ›› Issue (4): 47301-047301.doi: 10.1088/1674-1056/24/4/047301

• CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES • 上一篇下一篇

Enhanced surface plasmon interference lithography from cavity resonance in the grating slits

郭凯, 刘建龙, 周可雅, 刘树田

Department of Physics, Harbin Institute of Technology, Harbin 150001, China

收稿日期:2014-10-03 修回日期:2014-11-14 出版日期:2015-04-05 发布日期:2015-04-05
基金资助:
Project supported by the National Basic Research Program of China (Grant No. 2013CBA01702) and the National Natural Science Foundation of China (Grant Nos. 61377016, 61308017, and 61307072).

Enhanced surface plasmon interference lithography from cavity resonance in the grating slits

Guo Kai (郭凯), Liu Jian-Long (刘建龙), Zhou Ke-Ya (周可雅), Liu Shu-Tian (刘树田)

Department of Physics, Harbin Institute of Technology, Harbin 150001, China

Received:2014-10-03 Revised:2014-11-14 Online:2015-04-05 Published:2015-04-05
Contact: Liu Shu-Tian E-mail:stliu@hit.edu.cn
Supported by:
Project supported by the National Basic Research Program of China (Grant No. 2013CBA01702) and the National Natural Science Foundation of China (Grant Nos. 61377016, 61308017, and 61307072).

摘要/Abstract

摘要： Surface plasmon interference lithography based on grating diffraction has been studied both theoretically and experimentally in recent years. In this paper, we demonstrate that the cavity resonance in the grating slits can improve the subwavelength interference, not only the intensity but also the uniformity of the pattern. Both the typical lithography structure which merely consists of periodic metallic gratings and the modified structure equipped with a reflection layer are studied. The finite element method has been performed to study the interference pattern. Numerical simulations show that the property of the interference pattern is the optimum when cavity resonance happens. This enhancement can be applied to all the lithography structures which are based on the grating diffraction.

关键词: surface plasmons, lithography, cavity resonance

Abstract: Surface plasmon interference lithography based on grating diffraction has been studied both theoretically and experimentally in recent years. In this paper, we demonstrate that the cavity resonance in the grating slits can improve the subwavelength interference, not only the intensity but also the uniformity of the pattern. Both the typical lithography structure which merely consists of periodic metallic gratings and the modified structure equipped with a reflection layer are studied. The finite element method has been performed to study the interference pattern. Numerical simulations show that the property of the interference pattern is the optimum when cavity resonance happens. This enhancement can be applied to all the lithography structures which are based on the grating diffraction.

Key words: surface plasmons, lithography, cavity resonance

中图分类号: (Collective excitations (including excitons, polarons, plasmons and other charge-density excitations))

73.20.Mf

42.25.Hz (Interference) 42.82.Cr (Fabrication techniques; lithography, pattern transfer)

郭凯, 刘建龙, 周可雅, 刘树田. Enhanced surface plasmon interference lithography from cavity resonance in the grating slits[J]. , 2015, 24(4): 47301-047301.

Guo Kai (郭凯), Liu Jian-Long (刘建龙), Zhou Ke-Ya (周可雅), Liu Shu-Tian (刘树田). Enhanced surface plasmon interference lithography from cavity resonance in the grating slits[J]. Chin. Phys. B, 2015, 24(4): 47301-047301.

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Enhanced surface plasmon interference lithography from cavity resonance in the grating slits

Enhanced surface plasmon interference lithography from cavity resonance in the grating slits

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