中国物理B ›› 2010, Vol. 19 ›› Issue (2): 26802-026802.doi: 10.1088/1674-1056/19/2/026802

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Analytical results for the cluster size distribution in controlled deposition processes

陈效双1, 林振权1, 柯见洪2   

  1. (1)National Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China; (2)National Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China;College of Physics and Electronic Information Engineering, Wenzhou University, Wenzhou 325035, China
  • 收稿日期:2009-03-13 修回日期:2009-04-08 出版日期:2010-02-15 发布日期:2010-02-15
  • 基金资助:
    Project supported by the National Natural Science Foundation of China (Grant Nos. 10775104, 10875086 and 10305009).

Analytical results for the cluster size distribution in controlled deposition processes

Ke Jian-Hong(柯见洪)a)b)†, Chen Xiao-Shuang(陈效双)a), and Lin Zhen-Quan(林振权)b)   

  1. a National Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China; b College of Physics and Electronic Information Engineering, Wenzhou University, Wenzhou 325035, China
  • Received:2009-03-13 Revised:2009-04-08 Online:2010-02-15 Published:2010-02-15
  • Supported by:
    Project supported by the National Natural Science Foundation of China (Grant Nos. 10775104, 10875086 and 10305009).

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摘要： This paper proposes a controlled particle deposition model for cluster growth on the substrate surface and then presents exact results for the cluster (island) size distribution. In the system, at every time step a fixed number of particles are injected into the system and immediately deposited onto the substrate surface. It investigates the cluster size distribution by employing the generalized rate equation approach. The results exhibit that the evolution behaviour of the system depends crucially on the details of the adsorption rate kernel. The cluster size distribution can take the Poisson distribution or the conventional scaling form in some cases, while it is of a quite complex form in other cases.

Abstract: This paper proposes a controlled particle deposition model for cluster growth on the substrate surface and then presents exact results for the cluster (island) size distribution. In the system, at every time step a fixed number of particles are injected into the system and immediately deposited onto the substrate surface. It investigates the cluster size distribution by employing the generalized rate equation approach. The results exhibit that the evolution behaviour of the system depends crucially on the details of the adsorption rate kernel. The cluster size distribution can take the Poisson distribution or the conventional scaling form in some cases, while it is of a quite complex form in other cases.

Key words: cluster growth, deposition, kinetic behaviour

中图分类号:  (Methods of deposition of films and coatings; film growth and epitaxy)

  • 81.15.-z
68.55.A- (Nucleation and growth) 68.43.Mn (Adsorption kinetics ?)