中国物理B ›› 2008, Vol. 17 ›› Issue (8): 3021-3025.doi: 10.1088/1674-1056/17/8/043

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Influence of HF catalyst on the microstructure properties of ultra low-k thin films prepared by sol-gel method

何志巍1, 江祥华2, 王印月2, 徐大印3   

  1. (1)College of Science, China Agricultural University, Beijing 100083, China; (2)Department of Physics, Lanzhou University, Lanzhou 730000, China; (3)School of Opto-Electronic Information, Yantai University, Yantai 264700, China
  • 收稿日期:2007-07-22 修回日期:2007-12-09 出版日期:2008-08-20 发布日期:2008-08-20

Influence of HF catalyst on the microstructure properties of ultra low-k thin films prepared by sol-gel method

He Zhi-Wei(何志巍)a)†, Xu Da-Yin(徐大印)b), Jiang Xiang-Hua(江祥华)c), and Wang Yin-Yue(王印月)c)   

  1. a College of Science, China Agricultural University, Beijing 100083, China; b School of Opto-Electronic Information, Yantai University, Yantai 264700, China; c Department of Physics, Lanzhou University, Lanzhou 730000, China
  • Received:2007-07-22 Revised:2007-12-09 Online:2008-08-20 Published:2008-08-20

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摘要： This paper reports that by using the hydrofluoric acid (HF) as the acid catalyst, F doped nanoporous low-k SiO$_{2}$ thin films have been prepared by means of sol-gel method. The characterization of atomic force microscopy and Fourier transform infrared spectroscopy demonstrates that the HF catalyzed films are more hydrophobic. The N$_{2}$ adsorption/desorption experiments show that the suited introduction of HF increases the porosity and decreases the pore size distribution (about 10\,nm) in the films. The above results indicate that the hydrofluoric acid is the more suitable acid catalyst than the hydrochloric one for preparing nanoporous ultra low-k SiO$_{2}$ thin films.

关键词: microstructure, dielectric, catalyst, sol-gel

Abstract: This paper reports that by using the hydrofluoric acid (HF) as the acid catalyst, F doped nanoporous low-k SiO$_{2}$ thin films have been prepared by means of sol-gel method. The characterization of atomic force microscopy and Fourier transform infrared spectroscopy demonstrates that the HF catalyzed films are more hydrophobic. The N$_{2}$ adsorption/desorption experiments show that the suited introduction of HF increases the porosity and decreases the pore size distribution (about 10\,nm) in the films. The above results indicate that the hydrofluoric acid is the more suitable acid catalyst than the hydrochloric one for preparing nanoporous ultra low-k SiO$_{2}$ thin films.

Key words: microstructure, dielectric, catalyst, sol-gel

中图分类号: 

  • 77.55.+f
61.43.Gt (Powders, porous materials) 68.43.Mn (Adsorption kinetics ?) 68.55.-a (Thin film structure and morphology) 78.30.Hv (Other nonmetallic inorganics) 81.16.Hc (Catalytic methods)