中国物理B ›› 2005, Vol. 14 ›› Issue (7): 1471-1476.doi: 10.1088/1009-1963/14/7/036

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Three-dimensional micro- and nanometre composite aluminium patterns

赵小伟1, 高燕1, 王健雄1, 宋礼1, 刘东方1, 刘利峰1, 窦新元1, 罗述东1, 张增星1, 向彦娟1, 周维亚1, 王刚1, 江鹏2   

  1. (1)Center for Condensed Matter Physics, Institute of Physics,Chinese Academy of Sciences, Beijing 100080, China; (2)National Center for Nanoscience and Technology (NCNST),Beijing 100080, China
  • 收稿日期:2005-01-20 修回日期:2005-03-18 出版日期:2005-06-20 发布日期:2005-06-20
  • 基金资助:
    Project supported by the National Natural Science Foundation of China (Grant No G1999064592) and the State Key Programme of Basic Research of China (Grant No G1999064592).

Three-dimensional micro- and nanometre composite aluminium patterns

Zhao Xiao-Wei (赵小伟)a, Jiang Peng (江鹏)b, Gao Yan (高燕)a, Wang Jian-Xiong (王健雄)a, Song Li (宋礼)a, Liu Dong-Fang (刘东方)a, Liu Li-Feng (刘利峰)a, Dou Xin-Yuan (窦新元)a, Luo Shu-Dong (罗述东)a, Zhang Zeng-Xing (张增星)a, Xiang Yan-Juan (向彦娟)a, Zhou Wei-Ya (周维亚)a, Wang Gang (王刚)a   

  1. a Center for Condensed Matter Physics, Institute of Physics,Chinese Academy of Sciences, Beijing 100080, China; b National Center for Nanoscience and Technology (NCNST), Beijing 100080, China
  • Received:2005-01-20 Revised:2005-03-18 Online:2005-06-20 Published:2005-06-20
  • Supported by:
    Project supported by the National Natural Science Foundation of China (Grant No G1999064592) and the State Key Programme of Basic Research of China (Grant No G1999064592).

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摘要： Three-dimensional micro- and nanometre composite aluminium patterns are constructed on Al substrate by using photolithography, reactive ion etching and anodization. A layer of patterned SiO$_{2}$ mask is introduced as resist on the surface of Al foil, and during anodization the tilted nanopores and remaining Al microstructure are formed underneath the SiO$_{2}$ mask. The existence of SiO$_{2}$ mask leads to the deflection of electric field and effect on the transportation of ions, which results in the formation of laterally tilted nanopores, while the nanopores go down directly when being far from the boundaries of SiO$_{2}$. The vertical and lateral anodization processes proceeding simultaneously construct the Al microstructure under the patterned SiO$_{2}$ mask.

关键词: anodization, micro-machine, pattern

Abstract: Three-dimensional micro- and nanometre composite aluminium patterns are constructed on Al substrate by using photolithography, reactive ion etching and anodization. A layer of patterned SiO$_{2}$ mask is introduced as resist on the surface of Al foil, and during anodization the tilted nanopores and remaining Al microstructure are formed underneath the SiO$_{2}$ mask. The existence of SiO$_{2}$ mask leads to the deflection of electric field and effect on the transportation of ions, which results in the formation of laterally tilted nanopores, while the nanopores go down directly when being far from the boundaries of SiO$_{2}$. The vertical and lateral anodization processes proceeding simultaneously construct the Al microstructure under the patterned SiO$_{2}$ mask.

Key words: anodization, micro-machine, pattern

中图分类号:  (Micro- and nanoscale pattern formation)

  • 81.16.Rf
81.16.Nd (Micro- and nanolithography) 81.65.Cf (Surface cleaning, etching, patterning)