中国物理B ›› 2003, Vol. 12 ›› Issue (12): 1435-1439.doi: 10.1088/1009-1963/12/12/017
杨少鹏, 傅广生, 董国义, 李晓苇, 韩理
Yang Shao-Peng (杨少鹏), Fu Guang-Sheng (傅广生), Dong Guo-Yi (董国义), Li Xiao-Wei (李晓苇), Han Li (韩理)
摘要: The microwave absorption dielectric spectrum can be used to study the decay process of free photoelectrons and shallow-trapped electrons in semiconductor crystals. The decay curve of free photoelectrons and shallow-trapped electrons of silver halide grains is measured using this technique. The influence of iodide and K_4Fe(CN)_6 shallow electron trap dopants on the photoelectron lifetime of silver halide grains is studied. For the unsensitized cubic AgCl crystals, when the free photoelectron lifetime (FLT) reaches a maximum, the photographic efficiency is optimal. From our analysis, we conclude that FLT is the longest for the cubic AgCl crystals doped with 0.5% iodide at 80% doping position and 1×10^{-6} mol K_4Fe(CN)_6/molAg, whereas, for the highly photosensitized cubic AgBrCl crystals doped with K_4Fe(CN)_6, the photographic efficiency is optimal when the FLT reaches its minimum. The free photoelectron lifetime reaches minimum and the sensitivity of AgBrCl emulsion reaches maximum when the doping position is 30%Ag at K_4Fe(CN)_6 content of 10^{-6}mol/molAg.
中图分类号: (Light-sensitive materials)