中国物理B ›› 2003, Vol. 12 ›› Issue (1): 75-78.doi: 10.1088/1009-1963/12/1/313

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Nanocrystalline silicon films prepared by laser-induced crystallization

彭英才1, 傅广生2, 于 威2, 李社强2, 侯海虹2, 韩 理2   

  1. (1)College of Electronic and Informational Engineering, Hebei University, Baoding, 071002, China; (2)College of Physics Science and Technology, Hebei University, Baoding 071002, China
  • 收稿日期:2002-06-21 修回日期:2002-09-12 出版日期:2003-01-20 发布日期:2003-01-20
  • 基金资助:
    Project supported by the Natural Science Foundation of Hebei Province, China (Grant No 500084).

Nanocrystalline silicon films prepared by laser-induced crystallization

Fu Guang-Sheng (傅广生)a, Yu Wei (于 威)a, Li She-Qiang (李社强)a, Hou Hai-Hong (侯海虹)a, Peng Ying-Cai (彭英才)b, Han Li (韩 理)a   

  1. a College of Physics Science and Technology, Hebei University, Baoding 071002, China; b College of Electronic and Informational Engineering, Hebei University, Baoding, 071002, China
  • Received:2002-06-21 Revised:2002-09-12 Online:2003-01-20 Published:2003-01-20
  • Supported by:
    Project supported by the Natural Science Foundation of Hebei Province, China (Grant No 500084).

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摘要： The excimer laser-induced crystallization technique has been used to investigate the preparation of nanocrystalline silicon (nc-Si) from amorphous silicon ($\al$-Si) thin films on silicon or glass substrates. The $\al$-Si films without hydrogen grown by pulsed-laser deposition are chosen as precursor to avoid the problem of hydrogen effluence during annealing. Analyses have been performed by scanning electron microscopy, atomic force microscopy, Raman scattering spectroscopy and high-resolution transmission--electron microscopy. Experimental results show that silicon nanocrystals can be formed through laser annealing. The growth characters of nc-Si are strongly dependent on the laser energy density. It is shown that the volume of the molten silicon predominates essentially the grain size of nc-Si, and the surface tension of the crystallized silicon is responsible for the mechanism of nc-Si growth.

Abstract: The excimer laser-induced crystallization technique has been used to investigate the preparation of nanocrystalline silicon (nc-Si) from amorphous silicon ($\alpha$-Si) thin films on silicon or glass substrates. The $\alpha$-Si films without hydrogen grown by pulsed-laser deposition are chosen as precursor to avoid the problem of hydrogen effluence during annealing. Analyses have been performed by scanning electron microscopy, atomic force microscopy, Raman scattering spectroscopy and high-resolution transmission--electron microscopy. Experimental results show that silicon nanocrystals can be formed through laser annealing. The growth characters of nc-Si are strongly dependent on the laser energy density. It is shown that the volume of the molten silicon predominates essentially the grain size of nc-Si, and the surface tension of the crystallized silicon is responsible for the mechanism of nc-Si growth.

Key words: laser annealing, crystallization, nanocrystalline silicon

中图分类号:  (Nanocrystalline materials)

  • 81.07.Bc
81.05.Cy (Elemental semiconductors) 61.82.Fk (Semiconductors) 68.37.Ps (Atomic force microscopy (AFM)) 68.37.Ef (Scanning tunneling microscopy (including chemistry induced with STM)) 68.37.Lp (Transmission electron microscopy (TEM)) 78.30.Am (Elemental semiconductors and insulators) 78.66.Db (Elemental semiconductors and insulators)