中国物理B ›› 2011, Vol. 20 ›› Issue (12): 128101-128101.doi: 10.1088/1674-1056/20/12/128101

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Raman analysis of epitaxial graphene grown on 4H–SiC (0001) substrate under low pressure condition

张玉明1, 张义门1, 雷天民1, 郭辉1, 王悦湖1, 汤晓燕1, 王航1, 王党朝2   

  1. (1)School of Microelectronics, Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices, Xidian University, Xi'an 710071, China; (2)School of Microelectronics, Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices, Xidian University, Xi'an 710071, China;School of Physics and Electronic Engineering, Xianyang Normal College, Xianyang 712000, China
  • 收稿日期:2011-05-08 修回日期:2011-07-19 出版日期:2011-12-15 发布日期:2011-12-15
  • 基金资助:
    Project supported by the Key Research Foundation of the Ministry of Education of China (Grant No. JY10000925016).

Raman analysis of epitaxial graphene grown on 4H–SiC (0001) substrate under low pressure condition

Wang Dang-Chao(王党朝)a)b)†, Zhang Yu-Ming(张玉明) a), Zhang Yi-Men(张义门)a), Lei Tian-Min(雷天民)a), Guo Hui(郭辉)a), Wang Yue-Hu(王悦湖)a), Tang Xiao-Yan(汤晓燕)a), and Wang Hang(王航) a)   

  1. a School of Microelectronics, Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices, Xidian University, Xi'an 710071, China; School of Physics and Electronic Engineering, Xianyang Normal College, Xianyang 712000, China
  • Received:2011-05-08 Revised:2011-07-19 Online:2011-12-15 Published:2011-12-15
  • Supported by:
    Project supported by the Key Research Foundation of the Ministry of Education of China (Grant No. JY10000925016).

摘要: In this paper, we report a feasible route of growing epitaxial graphene on 4H-SiC (0001) substrate in a low pressure of 4 mbar (1 bar=105 Pa) with an argon flux of 2 standard liters per minute at 1200, 1300, 1400, and 1500 ℃ in a commercial chemical vapour deposition SiC reactor. Using Raman spectroscopy and scanning electron microscopy, we confirm that epitaxial graphene evidently forms on SiC surface above 1300 ℃ with a size of several microns. By fitting the 2D band of Raman data with two-Lorentzian function, and comparing with the published reports, we conclude that epitaxial graphene grown at 1300 ℃ is four-layer graphene.

关键词: SiC substrate, epitaxial graphene, Raman spectroscopy

Abstract: In this paper, we report a feasible route of growing epitaxial graphene on 4H-SiC (0001) substrate in a low pressure of 4 mbar (1 bar=105 Pa) with an argon flux of 2 standard liters per minute at 1200, 1300, 1400, and 1500 ℃ in a commercial chemical vapour deposition SiC reactor. Using Raman spectroscopy and scanning electron microscopy, we confirm that epitaxial graphene evidently forms on SiC surface above 1300 ℃ with a size of several microns. By fitting the 2D band of Raman data with two-Lorentzian function, and comparing with the published reports, we conclude that epitaxial graphene grown at 1300 ℃ is four-layer graphene.

Key words: SiC substrate, epitaxial graphene, Raman spectroscopy

中图分类号:  (Graphene)

  • 81.05.ue
78.30.-j (Infrared and Raman spectra) 61.48.Gh (Structure of graphene)