Thickness dependence of grain size and surface roughness for dc magnetron sputtered Au films

doi:10.1088/1674-1056/19/8/086802

中国物理B ›› 2010, Vol. 19 ›› Issue (8): 86802-086802.doi: 10.1088/1674-1056/19/8/086802

Thickness dependence of grain size and surface roughness for dc magnetron sputtered Au films

张鑫, 宋小会, 张殿琳

Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China

收稿日期:2010-05-17 修回日期:2010-06-01 出版日期:2010-08-15 发布日期:2010-08-15
基金资助:
Project supported by the National Basic Research Program of China (Grant No. 2006CB91304), and the Knowledge Innovation Program of the Chinese Academy of Sciences.

Thickness dependence of grain size and surface roughness for dc magnetron sputtered Au films

Zhang Xin(张鑫), Song Xiao-Hui(宋小会)^†, and Zhang Dian-Lin(张殿琳)

Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China

Received:2010-05-17 Revised:2010-06-01 Online:2010-08-15 Published:2010-08-15
Supported by:
Project supported by the National Basic Research Program of China (Grant No. 2006CB91304), and the Knowledge Innovation Program of the Chinese Academy of Sciences.

摘要/Abstract

摘要： The grain size and surface morphology of sputtered Au films are studied by x-ray diffraction and atomic force microscope. For as-deposited samples the grain growth mechanism is consistent with the two-dimensional (2D) theory, which gives relatively low diffusion coefficient during deposition. The annealing process demonstrates the secondary grain growth mechanism in which the thickness dependence of grain boundary energy plays a key role. The surface roughness increases with the increase of grain size.

Abstract: The grain size and surface morphology of sputtered Au films are studied by x-ray diffraction and atomic force microscope. For as-deposited samples the grain growth mechanism is consistent with the two-dimensional (2D) theory, which gives relatively low diffusion coefficient during deposition. The annealing process demonstrates the secondary grain growth mechanism in which the thickness dependence of grain boundary energy plays a key role. The surface roughness increases with the increase of grain size.

Key words: grain size, surface morphology, Au film, magnetron sputtering

中图分类号: (Structure of clean surfaces (and surface reconstruction))

68.35.B-

61.72.Mm (Grain and twin boundaries) 66.30.Fq (Self-diffusion in metals, semimetals, and alloys) 68.55.-a (Thin film structure and morphology) 81.15.Cd (Deposition by sputtering) 81.30.-t (Phase diagrams and microstructures developed by solidification and solid-solid phase transformations)

张鑫, 宋小会, 张殿琳. Thickness dependence of grain size and surface roughness for dc magnetron sputtered Au films[J]. 中国物理B, 2010, 19(8): 86802-086802.

Zhang Xin(张鑫), Song Xiao-Hui(宋小会), and Zhang Dian-Lin(张殿琳). Thickness dependence of grain size and surface roughness for dc magnetron sputtered Au films[J]. Chin. Phys. B, 2010, 19(8): 86802-086802.

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Thickness dependence of grain size and surface roughness for dc magnetron sputtered Au films

Thickness dependence of grain size and surface roughness for dc magnetron sputtered Au films

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