中国物理B ›› 2023, Vol. 32 ›› Issue (7): 78504-078504.doi: 10.1088/1674-1056/ac9cbb

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High on-state current p-type tunnel effect transistor based on doping modulation

Jiale Sun(孙佳乐)1, Yuming Zhang(张玉明)1, Hongliang Lu(吕红亮)1,†, Zhijun Lyu(吕智军)2, Yi Zhu(朱翊)1, Yuche Pan(潘禹澈)1, and Bin Lu(芦宾)3   

  1. 1 School of Microelectronics, Xidian University, The State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, Xi'an 710071, China;
    2 Department of Integrated Circuit Design, Institute of Microelectronics Technology, Xi'an 710071, China;
    3 School of Physics and Information Engineering, Shanxi Normal University, Taiyuan 030031, China
  • 收稿日期:2022-07-08 修回日期:2022-09-22 接受日期:2022-10-21 出版日期:2023-06-15 发布日期:2023-07-05
  • 通讯作者: Hongliang Lu E-mail:hllv@mail.xidian.edu.cn
  • 基金资助:
    Project supported by the Key Research and Development Program of Shaanxi (Grant No. 2021GY-010) and the National Defense Science and Technology Foundation Strengthening Program of China (Grant No. 2019-XXXX-XX-236-00).

High on-state current p-type tunnel effect transistor based on doping modulation

Jiale Sun(孙佳乐)1, Yuming Zhang(张玉明)1, Hongliang Lu(吕红亮)1,†, Zhijun Lyu(吕智军)2, Yi Zhu(朱翊)1, Yuche Pan(潘禹澈)1, and Bin Lu(芦宾)3   

  1. 1 School of Microelectronics, Xidian University, The State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, Xi'an 710071, China;
    2 Department of Integrated Circuit Design, Institute of Microelectronics Technology, Xi'an 710071, China;
    3 School of Physics and Information Engineering, Shanxi Normal University, Taiyuan 030031, China
  • Received:2022-07-08 Revised:2022-09-22 Accepted:2022-10-21 Online:2023-06-15 Published:2023-07-05
  • Contact: Hongliang Lu E-mail:hllv@mail.xidian.edu.cn
  • Supported by:
    Project supported by the Key Research and Development Program of Shaanxi (Grant No. 2021GY-010) and the National Defense Science and Technology Foundation Strengthening Program of China (Grant No. 2019-XXXX-XX-236-00).

摘要: To solve the problem of the low on-state current in p-type tunnel field-effect transistors (p-TFETs), this paper analyzes the mechanism of adjusting the tunneling current of a TFET device determined by studying the influence of the peak position of ion implantation on the potential of the p-TFET device surface and the width of the tunneling barrier. Doping-regulated silicon-based high on-state p-TFET devices are designed and fabricated, and the test results show that the on-state current of the fabricated devices can be increased by about two orders of magnitude compared with the current of other devices with the same structure. This method provides a new idea for the realization of high on-state current TFET devices.

关键词: tunnel field-effect transistors (TFET), band-to-band tunneling (BTBT), on-state current, doping modulation

Abstract: To solve the problem of the low on-state current in p-type tunnel field-effect transistors (p-TFETs), this paper analyzes the mechanism of adjusting the tunneling current of a TFET device determined by studying the influence of the peak position of ion implantation on the potential of the p-TFET device surface and the width of the tunneling barrier. Doping-regulated silicon-based high on-state p-TFET devices are designed and fabricated, and the test results show that the on-state current of the fabricated devices can be increased by about two orders of magnitude compared with the current of other devices with the same structure. This method provides a new idea for the realization of high on-state current TFET devices.

Key words: tunnel field-effect transistors (TFET), band-to-band tunneling (BTBT), on-state current, doping modulation

中图分类号:  (Junction breakdown and tunneling devices (including resonance tunneling devices))

  • 85.30.Mn
85.40.Ry (Impurity doping, diffusion and ion implantation technology) 73.40.Gk (Tunneling)