中国物理B ›› 2022, Vol. 31 ›› Issue (10): 106801-106801.doi: 10.1088/1674-1056/ac6941

• CONDENSED MATTER: STRUCTURAL, MECHANICAL, AND THERMAL PROPERTIES • 上一篇    下一篇

First principles study of hafnium intercalation between graphene and Ir(111) substrate

Hao Peng(彭浩)1, Xin Jin(金鑫)1, Yang Song(宋洋)1, and Shixuan Du(杜世萱)1,2,3,4,†   

  1. 1. Institute of Physics, and University of Chinese Academy of Sciences, Chinese Academy of Sciences, Beijing 100190, China;
    2. CAS Center for Excellence in Topological Quantum Computation, University of Chinese Academy of Sciences, Beijing 100190, China;
    3. Beijing National Center for Condensed Matter Physics, Beijing 100190, China;
    4. Songshan Lake Materials Laboratory, Dongguan 523808, China
  • 收稿日期:2022-02-25 修回日期:2022-04-07 出版日期:2022-10-16 发布日期:2022-09-16
  • 通讯作者: Shixuan Du E-mail:sxdu@iphy.ac.cn
  • 基金资助:
    Project supported by the National Natural Science Foundation of China (Grant No. 61888102), the Strategic Priority Research Program of the Chinese Academy of Sciences (Grant No. XDB30000000), and the Fundamental Research Funds for the Central Universities, China.

First principles study of hafnium intercalation between graphene and Ir(111) substrate

Hao Peng(彭浩)1, Xin Jin(金鑫)1, Yang Song(宋洋)1, and Shixuan Du(杜世萱)1,2,3,4,†   

  1. 1. Institute of Physics, and University of Chinese Academy of Sciences, Chinese Academy of Sciences, Beijing 100190, China;
    2. CAS Center for Excellence in Topological Quantum Computation, University of Chinese Academy of Sciences, Beijing 100190, China;
    3. Beijing National Center for Condensed Matter Physics, Beijing 100190, China;
    4. Songshan Lake Materials Laboratory, Dongguan 523808, China
  • Received:2022-02-25 Revised:2022-04-07 Online:2022-10-16 Published:2022-09-16
  • Contact: Shixuan Du E-mail:sxdu@iphy.ac.cn
  • Supported by:
    Project supported by the National Natural Science Foundation of China (Grant No. 61888102), the Strategic Priority Research Program of the Chinese Academy of Sciences (Grant No. XDB30000000), and the Fundamental Research Funds for the Central Universities, China.

摘要: The intercalation of heteroatoms between graphene and metal substrates is a promising method for integrating epitaxial graphene with functional materials. Various elements and their oxides have been successfully intercalated into graphene/metal interfaces to form graphene-based heterostructures, showing potential applications in electronic devices. Here we theoretically investigate the hafnium intercalation between graphene and Ir(111). It is found that the penetration barrier of Hf atom is significantly large due to its large atomic radius, which suggests that hafnium intercalation should be carried out with low deposition doses of Hf atoms and high annealing temperatures. Our results show the different intercalation behaviors of a large-size atom and provide guidance for the integration of graphene and hafnium oxide in device applications.

关键词: first principles calculation, intercalation, graphene, hafnium

Abstract: The intercalation of heteroatoms between graphene and metal substrates is a promising method for integrating epitaxial graphene with functional materials. Various elements and their oxides have been successfully intercalated into graphene/metal interfaces to form graphene-based heterostructures, showing potential applications in electronic devices. Here we theoretically investigate the hafnium intercalation between graphene and Ir(111). It is found that the penetration barrier of Hf atom is significantly large due to its large atomic radius, which suggests that hafnium intercalation should be carried out with low deposition doses of Hf atoms and high annealing temperatures. Our results show the different intercalation behaviors of a large-size atom and provide guidance for the integration of graphene and hafnium oxide in device applications.

Key words: first principles calculation, intercalation, graphene, hafnium

中图分类号:  (Ab initio calculations of adsorbate structure and reactions)

  • 68.43.Bc
81.05.ue (Graphene) 68.35.Fx (Diffusion; interface formation)