中国物理B ›› 2016, Vol. 25 ›› Issue (7): 75202-075202.doi: 10.1088/1674-1056/25/7/075202
• PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES • 上一篇 下一篇
Ming-Wei Gao(高明伟), Chao Ye(叶超), Xiang-Ying Wang(王响英), Yi-Song He(何一松), Jia-Min Guo(郭佳敏), Pei-Fang Yang(杨培芳)
Ming-Wei Gao(高明伟)1, Chao Ye(叶超)1,2, Xiang-Ying Wang(王响英)3, Yi-Song He(何一松)1, Jia-Min Guo(郭佳敏)1, Pei-Fang Yang(杨培芳)1
摘要: Growth and structural properties of thin a-C films prepared by the 60 MHz very-high-frequency (VHF) magnetron sputtering were investigated. The energy and flux of ions impinging the substrate were also analyzed. It is found that the thin a-C films prepared by the 60 MHz sputtering have a lower growth rate, a smooth surface, and more sp3 contents. These features are related to the higher ion energy and the lower ions flux onto the substrate. Therefore, the 60 MHz VHF sputtering is more suitable for the preparation of thin a-C film with more sp3 contents.
中图分类号: (High-frequency and RF discharges)