中国物理B ›› 2021, Vol. 30 ›› Issue (9): 98502-098502.doi: 10.1088/1674-1056/abf135

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C band microwave damage characteristics of pseudomorphic high electron mobility transistor

Qi-Wei Li(李奇威)1,2,†, Jing Sun(孙静)2, Fu-Xing Li(李福星)3, Chang-Chun Chai(柴常春)3, Jun Ding(丁君)1, and Jin-Yong Fang(方进勇)2   

  1. 1 School of Electronics and Information, Northwestern Polytechnical University, Xi'an 710129, China;
    2 China Academy of Space Technology(Xi'an), Xi'an 710100, China;
    3 Key Laboratory of Ministry of Education for Wide Band-Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University, Xi'an 710071, China
  • 收稿日期:2020-11-27 修回日期:2021-03-02 接受日期:2021-03-24 出版日期:2021-08-19 发布日期:2021-08-24
  • 通讯作者: Qi-Wei Li E-mail:liqiwei161@163.com
  • 基金资助:
    Project supported by the Foundation Enhancement Plan and the National Natural Science Foundation of China (Grant No. 61974116).

C band microwave damage characteristics of pseudomorphic high electron mobility transistor

Qi-Wei Li(李奇威)1,2,†, Jing Sun(孙静)2, Fu-Xing Li(李福星)3, Chang-Chun Chai(柴常春)3, Jun Ding(丁君)1, and Jin-Yong Fang(方进勇)2   

  1. 1 School of Electronics and Information, Northwestern Polytechnical University, Xi'an 710129, China;
    2 China Academy of Space Technology(Xi'an), Xi'an 710100, China;
    3 Key Laboratory of Ministry of Education for Wide Band-Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University, Xi'an 710071, China
  • Received:2020-11-27 Revised:2021-03-02 Accepted:2021-03-24 Online:2021-08-19 Published:2021-08-24
  • Contact: Qi-Wei Li E-mail:liqiwei161@163.com
  • Supported by:
    Project supported by the Foundation Enhancement Plan and the National Natural Science Foundation of China (Grant No. 61974116).

摘要: The damage effect characteristics of GaAs pseudomorphic high electron mobility transistor (pHEMT) under the irradiation of C band high-power microwave (HPM) is investigated in this paper. Based on the theoretical analysis, the thermoelectric coupling model is established, and the key damage parameters of the device under typical pulse conditions are predicted, including the damage location, damage power, etc. By the injection effect test and device microanatomy analysis through using scanning electron microscope (SEM) and energy dispersive spectrometer (EDS), it is concluded that the gate metal in the first stage of the device is the vulnerable to HPM damage, especially the side below the gate near the source. The damage power in the injection test is about 40 dBm and in good agreement with the simulation result. This work has a certain reference value for microwave damage assessment of pHEMT.

关键词: high power microwave, pseudomorphic high electron mobility transistor, damage mechanism, C band, low noise amplifier (LNA)

Abstract: The damage effect characteristics of GaAs pseudomorphic high electron mobility transistor (pHEMT) under the irradiation of C band high-power microwave (HPM) is investigated in this paper. Based on the theoretical analysis, the thermoelectric coupling model is established, and the key damage parameters of the device under typical pulse conditions are predicted, including the damage location, damage power, etc. By the injection effect test and device microanatomy analysis through using scanning electron microscope (SEM) and energy dispersive spectrometer (EDS), it is concluded that the gate metal in the first stage of the device is the vulnerable to HPM damage, especially the side below the gate near the source. The damage power in the injection test is about 40 dBm and in good agreement with the simulation result. This work has a certain reference value for microwave damage assessment of pHEMT.

Key words: high power microwave, pseudomorphic high electron mobility transistor, damage mechanism, C band, low noise amplifier (LNA)

中图分类号:  (Field effect devices)

  • 85.30.Tv
84.40.-x (Radiowave and microwave (including millimeter wave) technology)