中国物理B ›› 2014, Vol. 23 ›› Issue (6): 65204-065204.doi: 10.1088/1674-1056/23/6/065204

• PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES • 上一篇    下一篇

Synthesis of ZrSiN composite films using a plasma focus device

R. Ahmada, T. Hussaina, I. A. Khanb, R. S. Rawatc   

  1. a Center for Advanced Studies in Physics, GC University, 54000 Lahore, Pakistan;
    b Physics Department, GC University Faisalabad, Pakistan;
    c National Institute of Education, Nanyang Technological University, Singapore 637616, Singapore
  • 收稿日期:2013-11-01 修回日期:2013-12-03 出版日期:2014-06-15 发布日期:2014-06-15
  • 基金资助:
    Project supported by the National Project for Research for University, the Higher Education Commission (HEC), Pakistan.

Synthesis of ZrSiN composite films using a plasma focus device

R. Ahmada, T. Hussaina, I. A. Khanb, R. S. Rawatc   

  1. a Center for Advanced Studies in Physics, GC University, 54000 Lahore, Pakistan;
    b Physics Department, GC University Faisalabad, Pakistan;
    c National Institute of Education, Nanyang Technological University, Singapore 637616, Singapore
  • Received:2013-11-01 Revised:2013-12-03 Online:2014-06-15 Published:2014-06-15
  • Contact: T. Hussain E-mail:tousifhussain@gcu.edu.pk
  • Supported by:
    Project supported by the National Project for Research for University, the Higher Education Commission (HEC), Pakistan.

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摘要： ZrSiN thin films are synthesized by using plasma focus through various numbers of focus shots (10, 20, and 30), with samples placed at 9 cm away from the tip of the anode. Crystal structures, surface morphologies, and elemental compositions of ZrSiN films are characterized by an X-ray diffractometer (XRD) and scanning electron microscope (SEM) attached with energy dispersive X-ray spectroscopy (EDS). XRD patterns confirm the formations of polycrystalline ZrSiN films. Crystallinity of nitride increases with the increase of focus shot number. The average crystallite size of zirconium nitride increases from 27 ± 3 nm to 73 ± 8 nm and microstrain decreases from 2.28 to 1.0 with the increase of the focus shot number. SEM results exhibit the formations of granular and oval-shaped microstructures, depending on the number of focus shots. EDS results confirm the presences of silicon, zirconium, nitrogen, and oxygen in the composite films. The content values of Zr and N in the composite films increase with the increase of the focus shot number.

关键词: DPF, ZrSiN thin films, XRD, SEM

Abstract: ZrSiN thin films are synthesized by using plasma focus through various numbers of focus shots (10, 20, and 30), with samples placed at 9 cm away from the tip of the anode. Crystal structures, surface morphologies, and elemental compositions of ZrSiN films are characterized by an X-ray diffractometer (XRD) and scanning electron microscope (SEM) attached with energy dispersive X-ray spectroscopy (EDS). XRD patterns confirm the formations of polycrystalline ZrSiN films. Crystallinity of nitride increases with the increase of focus shot number. The average crystallite size of zirconium nitride increases from 27 ± 3 nm to 73 ± 8 nm and microstrain decreases from 2.28 to 1.0 with the increase of the focus shot number. SEM results exhibit the formations of granular and oval-shaped microstructures, depending on the number of focus shots. EDS results confirm the presences of silicon, zirconium, nitrogen, and oxygen in the composite films. The content values of Zr and N in the composite films increase with the increase of the focus shot number.

Key words: DPF, ZrSiN thin films, XRD, SEM

中图分类号:  (Dense plasma focus)

  • 52.59.Hq
52.77.Dq (Plasma-based ion implantation and deposition) 61.05.cp (X-ray diffraction) 68.37.Hk (Scanning electron microscopy (SEM) (including EBIC))