Comparative investigation of resistance and ability to trigger high voltage discharge for single and multiple femtosecond filaments in air

doi:10.1088/1674-1056/22/3/035203

中国物理B ›› 2013, Vol. 22 ›› Issue (3): 35203-035203.doi: 10.1088/1674-1056/22/3/035203

• PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES • 上一篇下一篇

Comparative investigation of resistance and ability to trigger high voltage discharge for single and multiple femtosecond filaments in air

郭凯敏^{a b}, 郝作强^a, 林景全^a, 孙长凯^a, 高勋^a, 赵振明^a

a School of Science, Changchun University of Science and Technology, Changchun 130022, China;
b School of Physical Science and Technology, Baotou Teachers College, Baotou 014030, China

收稿日期:2012-05-26 修回日期:2012-11-05 出版日期:2013-02-01 发布日期:2013-02-01
基金资助:
Project supported by the National Natural Science Foundation of China (Grant Nos. 11074027, 60978014, 61178022, 11274053, and 11211120156), the Funds from Sci. & Tech. Deparment of Jilin Province, China (Grant No. 20111812).

Comparative investigation of resistance and ability to trigger high voltage discharge for single and multiple femtosecond filaments in air

Guo Kai-Min (郭凯敏)^{a b}, Hao Zuo-Qiang (郝作强)^a, Lin Jing-Quan (林景全)^a, Sun Chang-Kai (孙长凯)^a, Gao Xun (高勋)^a, Zhao Zhen-Ming (赵振明)^a

a School of Science, Changchun University of Science and Technology, Changchun 130022, China;
b School of Physical Science and Technology, Baotou Teachers College, Baotou 014030, China

Received:2012-05-26 Revised:2012-11-05 Online:2013-02-01 Published:2013-02-01
Contact: Lin Jing-Quan E-mail:linjingquan@cust.edu.cn
Supported by:
Project supported by the National Natural Science Foundation of China (Grant Nos. 11074027, 60978014, 61178022, 11274053, and 11211120156), the Funds from Sci. & Tech. Deparment of Jilin Province, China (Grant No. 20111812).

摘要/Abstract

摘要： A comparative investigation of resistance and ability to trigger high voltage (HV) discharge for single filament (SF) and multiple filaments (MF) has been carried out. The experimental results show that the trend of the breakdown threshold of the SF exactly follows that of its resistance, but this is not the case for the MF. The MF's resistance is much smaller than SF's. However, the MF shows a bit higher HV breakdown threshold than the SF. The underlying physics is that the measured resistance of the MF is collectively contributed by every filament in the MF while the HV breakdown threshold is determined by only one single discharging path.

关键词: femtosecond filament, resistance, high voltage breakdown threshold

Abstract: A comparative investigation of resistance and ability to trigger high voltage (HV) discharge for single filament (SF) and multiple filaments (MF) has been carried out. The experimental results show that the trend of the breakdown threshold of the SF exactly follows that of its resistance, but this is not the case for the MF. The MF's resistance is much smaller than SF's. However, the MF shows a bit higher HV breakdown threshold than the SF. The underlying physics is that the measured resistance of the MF is collectively contributed by every filament in the MF while the HV breakdown threshold is determined by only one single discharging path.

Key words: femtosecond filament, resistance, high voltage breakdown threshold

中图分类号: (Self-focussing, channeling, and filamentation in plasmas)

52.38.Hb

郭凯敏, 郝作强, 林景全, 孙长凯, 高勋, 赵振明. Comparative investigation of resistance and ability to trigger high voltage discharge for single and multiple femtosecond filaments in air[J]. 中国物理B, 2013, 22(3): 35203-035203.

Guo Kai-Min (郭凯敏), Hao Zuo-Qiang (郝作强), Lin Jing-Quan (林景全), Sun Chang-Kai (孙长凯), Gao Xun (高勋), Zhao Zhen-Ming (赵振明). Comparative investigation of resistance and ability to trigger high voltage discharge for single and multiple femtosecond filaments in air[J]. Chin. Phys. B, 2013, 22(3): 35203-035203.

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Comparative investigation of resistance and ability to trigger high voltage discharge for single and multiple femtosecond filaments in air

Comparative investigation of resistance and ability to trigger high voltage discharge for single and multiple femtosecond filaments in air

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