中国物理B ›› 2013, Vol. 22 ›› Issue (3): 35204-035204.doi: 10.1088/1674-1056/22/3/035204

• PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES • 上一篇    下一篇

Effect of pulsed bias on properties of ZrN/TiZrN films deposited by cathodic vacuum arc

张国平, 王兴权, 吕国华, 周澜, 黄骏, 陈维, 杨思泽   

  1. Institute of Physics, Chinese Academy of Science, Beijing 100080, China
  • 收稿日期:2012-06-25 修回日期:2012-08-09 出版日期:2013-02-01 发布日期:2013-02-01
  • 基金资助:
    Project supported by the National Magnetic Confinement Fusion Science Program of China (Grant No.2009GB106004).

Effect of pulsed bias on properties of ZrN/TiZrN films deposited by cathodic vacuum arc

Zhang Guo-Ping (张国平), Wang Xing-Quan (王兴权), Lü Guo-Hua (吕国华), Zhou Lan (周澜), Huang Jun (黄骏), Chen Wei (陈维), Yang Si-Ze (杨思泽)   

  1. Institute of Physics, Chinese Academy of Science, Beijing 100080, China
  • Received:2012-06-25 Revised:2012-08-09 Online:2013-02-01 Published:2013-02-01
  • Contact: Yang Si-Ze E-mail:yangsz@aphy.iphy.ac.cn
  • Supported by:
    Project supported by the National Magnetic Confinement Fusion Science Program of China (Grant No.2009GB106004).

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摘要： ZrN/TiZrN multilayer are deposited by cathodic vacuum arc method with different substrate bias (from 0 to -800 V), using Ti and Zr plasma flows in residual N2 atmosphere, combined with ion bombardment of sample surfaces. The effect of pulsed bias on structure and properties of films is investigated. Microstructure of the coating is analyzed by X-ray diffraction (XRD), and scanning electron microscopy (SEM). Meanwhile, the nanohardness, Young's modulus, and scratch tests are performed. The experimental results show that the films exhibit a nanoscale multilayer structure consisting of TiZrN and ZrN phases. Solid solutions are formed for component TiZrN films. The dominant preferred orientation of TiZrN films is (111) and (220). At pulsed bias of -200 V, the nanohardness and the adhesion strength of ZrN/TiZrN multilayer reach a maximum of 38 GPa, and 78 N, respectively. The ZrN/TiZrN multilayer demonstrates an enhanced nanohardness compared with binary TiN and ZrN films deposited under equivalent conditions.

关键词: physical vapor deposition, TiZrN films, pulsed bias, cathodic vacuum arc

Abstract: ZrN/TiZrN multilayer are deposited by cathodic vacuum arc method with different substrate bias (from 0 to -800 V), using Ti and Zr plasma flows in residual N2 atmosphere, combined with ion bombardment of sample surfaces. The effect of pulsed bias on structure and properties of films is investigated. Microstructure of the coating is analyzed by X-ray diffraction (XRD), and scanning electron microscopy (SEM). Meanwhile, the nanohardness, Young's modulus, and scratch tests are performed. The experimental results show that the films exhibit a nanoscale multilayer structure consisting of TiZrN and ZrN phases. Solid solutions are formed for component TiZrN films. The dominant preferred orientation of TiZrN films is (111) and (220). At pulsed bias of -200 V, the nanohardness and the adhesion strength of ZrN/TiZrN multilayer reach a maximum of 38 GPa, and 78 N, respectively. The ZrN/TiZrN multilayer demonstrates an enhanced nanohardness compared with binary TiN and ZrN films deposited under equivalent conditions.

Key words: physical vapor deposition, TiZrN films, pulsed bias, cathodic vacuum arc

中图分类号:  (Plasma applications)

  • 52.77.-j
52.75.-d (Plasma devices) 61.82.Bg (Metals and alloys)