Chin. Phys. B ›› 2013, Vol. 22 ›› Issue (12): 127306-127306.doi: 10.1088/1674-1056/22/12/127306

• CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES • 上一篇    下一篇

Post-annealing effect on the structural and mechanical properties of multiphase zirconia films deposited by a plasma focus device

I. A. Khana, R. S. Rawatb, R. Ahmadc, M. A. K. Shahida   

  1. a Department of Physics, Government College University, 38000 Faisalabad, Pakistan;
    b National Institute of Education, Nanyang Technological University, Singapore 637616, Singapore;
    c Department of Physics, GC University, 54000 Lahore, Pakistan
  • 收稿日期:2013-03-27 修回日期:2013-05-14 出版日期:2013-10-25 发布日期:2013-10-25
  • 基金资助:
    Project supported by the Higher Education Commission of Pakistan.

Post-annealing effect on the structural and mechanical properties of multiphase zirconia films deposited by a plasma focus device

I. A. Khana, R. S. Rawatb, R. Ahmadc, M. A. K. Shahida   

  1. a Department of Physics, Government College University, 38000 Faisalabad, Pakistan;
    b National Institute of Education, Nanyang Technological University, Singapore 637616, Singapore;
    c Department of Physics, GC University, 54000 Lahore, Pakistan
  • Received:2013-03-27 Revised:2013-05-14 Online:2013-10-25 Published:2013-10-25
  • Contact: I. A. Khan E-mail:ejaz_phd@yahoo.com
  • Supported by:
    Project supported by the Higher Education Commission of Pakistan.

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摘要： Nanostructured multiphase zirconia films (MZFs) are deposited on Zr substrate by the irradiation of energetic oxygen ions emanated from a plasma focus device. The oxygen operating gas pressure of 1 mbar (1 bar=105 Pa) provides the most appropriate ion energy flux to deposit crystalline ZrO2 films. X-ray diffraction (XRD) patterns reveal the formation of polycrystalline ZrO2 films. The crystallite size (CS), crystal growth, and dislocation densities are attributed to increasing focus shots, sample axial distances, and working gas pressures. Phase and orientation transformations from t-ZrO2 to m-ZrO2 and c-ZrO2 are associated with increasing focus shots and continuous annealing. For lower (200 ℃) annealing temperature (AT), full width at half maximum (FWHM) of diffraction peak, CS, and dislocation density (δ) for (020) plane are found to be 0.494, 16.6 nm, and 3.63×10-3 nm-2 while for higher (400 ℃) AT, these parameters for (111) plane are found to be 0.388, 20.87 nm, and 2.29×10-3 nm-2, respectively. Scanning electron microscope (SEM) results demonstrate the formation of rounded grains with uniform distribution. The estimated values of atomic ratio (O/Zr) in ZrO2 films deposited for different axial distances (6 cm, 9 cm, and 12 cm) are found to be 2.1, 2.2, and 2.3, respectively. Fourier transform infrared (FTIR) analysis reveals that the bands appearing at 441 cm-1 and 480 cm-1 belong to m-ZrO2 and t-ZrO2 phases, respectively. Maximum microhardness (8.65±0.45 GPa) of ZrO2 film is ～ 6.7 times higher than the microhardness of virgin Zr.

关键词: zrconia, phase transformation, XRD, SEM, Fourier transform infrared analysis

Abstract: Nanostructured multiphase zirconia films (MZFs) are deposited on Zr substrate by the irradiation of energetic oxygen ions emanated from a plasma focus device. The oxygen operating gas pressure of 1 mbar (1 bar=105 Pa) provides the most appropriate ion energy flux to deposit crystalline ZrO2 films. X-ray diffraction (XRD) patterns reveal the formation of polycrystalline ZrO2 films. The crystallite size (CS), crystal growth, and dislocation densities are attributed to increasing focus shots, sample axial distances, and working gas pressures. Phase and orientation transformations from t-ZrO2 to m-ZrO2 and c-ZrO2 are associated with increasing focus shots and continuous annealing. For lower (200 ℃) annealing temperature (AT), full width at half maximum (FWHM) of diffraction peak, CS, and dislocation density (δ) for (020) plane are found to be 0.494, 16.6 nm, and 3.63×10-3 nm-2 while for higher (400 ℃) AT, these parameters for (111) plane are found to be 0.388, 20.87 nm, and 2.29×10-3 nm-2, respectively. Scanning electron microscope (SEM) results demonstrate the formation of rounded grains with uniform distribution. The estimated values of atomic ratio (O/Zr) in ZrO2 films deposited for different axial distances (6 cm, 9 cm, and 12 cm) are found to be 2.1, 2.2, and 2.3, respectively. Fourier transform infrared (FTIR) analysis reveals that the bands appearing at 441 cm-1 and 480 cm-1 belong to m-ZrO2 and t-ZrO2 phases, respectively. Maximum microhardness (8.65±0.45 GPa) of ZrO2 film is ～ 6.7 times higher than the microhardness of virgin Zr.

Key words: zrconia, phase transformation, XRD, SEM, Fourier transform infrared analysis

中图分类号:  (Thermoelectric effects)

  • 73.50.Lw
68.60.Bs (Mechanical and acoustical properties) 68.55.J- (Morphology of films) 61.72.-y (Defects and impurities in crystals; microstructure)