中国物理B ›› 2012, Vol. 21 ›› Issue (7): 78104-078104.doi: 10.1088/1674-1056/21/7/078104

• INTERDISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY • 上一篇    下一篇

Effect of post thermal annealing on the structural and optical properties of ZnO thin films prepared from polymer precursor

Jijoy. P. Mathewa, George Vargheseb, Jacob Mathewa   

  1. a Thin Film Research Laboratory, Department of Physics, St. Berchmans College, Changanassery, Kerala 686101, India;
    b Department of Physics, Calicut University, Thenjippalam, Kerala, India
  • 收稿日期:2011-12-19 出版日期:2012-06-01 发布日期:2012-06-01

Effect of post thermal annealing on the structural and optical properties of ZnO thin films prepared from polymer precursor

Jijoy.~P.~Mathewa)†, George Vargheseb), and Jacob Mathewa)   

  1. a Thin Film Research Laboratory, Department of Physics, St. Berchmans College, Changanassery, Kerala 686101, India;
    b Department of Physics, Calicut University, Thenjippalam, Kerala, India
  • Received:2011-12-19 Online:2012-06-01 Published:2012-06-01
  • Contact: Jijoy. P. Mathew E-mail:mathew.jijoy@gmail.com

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摘要： ZnO thin films were synthesised by a new method which uses polyvinyl alcohol (PVA) as polymer precursor. The films are annealed at different temperatures and for different annealing times. The structural parameters, like grain size, lattice constants, optical band gap, and Urbach energy, depend on the annealing temperature and annealing time. All the films possess tensile strain which relaxes as the annealing temperature and the annealing time increases. The photoluminescence (PL) spectra contain only ultraviolet (UV) peaks at low temperature, but as the annealing temperature and time increase we observe peaks at blue and green regions with variation of the intensities of these peaks with annealing temperature and annealing time.

关键词: stress, band gap, Urbach energy, photoluminescence

Abstract: ZnO thin films were synthesised by a new method which uses polyvinyl alcohol (PVA) as polymer precursor. The films are annealed at different temperatures and for different annealing times. The structural parameters, like grain size, lattice constants, optical band gap, and Urbach energy, depend on the annealing temperature and annealing time. All the films possess tensile strain which relaxes as the annealing temperature and the annealing time increases. The photoluminescence (PL) spectra contain only ultraviolet (UV) peaks at low temperature, but as the annealing temperature and time increase we observe peaks at blue and green regions with variation of the intensities of these peaks with annealing temperature and annealing time.

Key words: stress, band gap, Urbach energy, photoluminescence

中图分类号:  (Pulsed laser ablation deposition)

  • 81.15.Fg
78.40.Fy (Semiconductors) 81.40.Ef (Cold working, work hardening; annealing, post-deformation annealing, quenching, tempering recovery, and crystallization) 61.05.cp (X-ray diffraction)