中国物理B ›› 2012, Vol. 21 ›› Issue (1): 16101-016101.doi: 10.1088/1674-1056/21/1/016101
李红轩1, 吉利1, 吴艳霞1, 周惠娣1, 陈建敏1, 王永军2, 刘晓红2
Wang Yong-Jun(王永军)a)b), Li Hong-Xuan(李红轩)a), Ji Li(吉利)a), Liu Xiao-Hong(刘晓红)a), Wu Yan-Xia(吴艳霞)a)b), Zhou Hui-Di(周惠娣)a), and Chen Jian-Min(陈建敏)a)†
摘要: Amorphous carbon films with high sp2 concentrations are deposited by unbalanced magnetron sputtering with a narrow range of substrate bias voltage. Field emission scanning electron microscopes (FESEMs), high resolution transmission electron microscopes (HRTEMs), atomic force microscopes (AFMs), the Raman spectrometers, nano-indentation, and tribometers are subsequently used to characterize the microstructures and the properties of the resulting films. It is found that the present films are dominated by the sp2 sites. However, the films demonstrate a moderate hardness together with a low internal stress. The high hardness of the deposited film originates from the crosslinking of the sp2 clusters by the sp3 sites. The presence of the graphite-like clusters in the film structure may be responsible for the low internal stress. What is more important is that the resulting films show excellent tribological properties with high load capacity and excellent wear resistance in humid atmospheres. The relationship between the microstructure determined by the deposition condition and the film characteristic is discussed in detail.
中图分类号: (Amorphous semiconductors, metals, and alloys)