中国物理B ›› 2012, Vol. 21 ›› Issue (1): 16101-016101.doi: 10.1088/1674-1056/21/1/016101

• • 上一篇    下一篇

Superior tribological properties of an amorphous carbon film with a graphite-like structure

李红轩1, 吉利1, 吴艳霞1, 周惠娣1, 陈建敏1, 王永军2, 刘晓红2   

  1. (1)State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, China; (2)State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, China; Graduate University of the Chinese Academy of Sciences, Beijing 100049, China
  • 收稿日期:2011-03-04 修回日期:2011-08-16 出版日期:2012-01-15 发布日期:2012-01-20
  • 基金资助:
    Project supported by the National Natural Science Foundation of China (Grant Nos. 50705093 and 50575217), the Innovative Group Foundation of the National Natural Science Foundation of China (Grant No. 50421502), and the National Basic Research Program of

Superior tribological properties of an amorphous carbon film with a graphite-like structure

Wang Yong-Jun(王永军)a)b), Li Hong-Xuan(李红轩)a), Ji Li(吉利)a), Liu Xiao-Hong(刘晓红)a), Wu Yan-Xia(吴艳霞)a)b), Zhou Hui-Di(周惠娣)a), and Chen Jian-Min(陈建敏)a)†   

  1. a State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, China; b Graduate University of the Chinese Academy of Sciences, Beijing 100049, China
  • Received:2011-03-04 Revised:2011-08-16 Online:2012-01-15 Published:2012-01-20
  • Supported by:
    Project supported by the National Natural Science Foundation of China (Grant Nos. 50705093 and 50575217), the Innovative Group Foundation of the National Natural Science Foundation of China (Grant No. 50421502), and the National Basic Research Program of

PDF (PC)

933

赞

摘要： Amorphous carbon films with high sp2 concentrations are deposited by unbalanced magnetron sputtering with a narrow range of substrate bias voltage. Field emission scanning electron microscopes (FESEMs), high resolution transmission electron microscopes (HRTEMs), atomic force microscopes (AFMs), the Raman spectrometers, nano-indentation, and tribometers are subsequently used to characterize the microstructures and the properties of the resulting films. It is found that the present films are dominated by the sp2 sites. However, the films demonstrate a moderate hardness together with a low internal stress. The high hardness of the deposited film originates from the crosslinking of the sp2 clusters by the sp3 sites. The presence of the graphite-like clusters in the film structure may be responsible for the low internal stress. What is more important is that the resulting films show excellent tribological properties with high load capacity and excellent wear resistance in humid atmospheres. The relationship between the microstructure determined by the deposition condition and the film characteristic is discussed in detail.

关键词: magnetron sputtering, graphite-like carbon film, microstructure, performance

Abstract: Amorphous carbon films with high sp2 concentrations are deposited by unbalanced magnetron sputtering with a narrow range of substrate bias voltage. Field emission scanning electron microscopes (FESEMs), high resolution transmission electron microscopes (HRTEMs), atomic force microscopes (AFMs), the Raman spectrometers, nano-indentation, and tribometers are subsequently used to characterize the microstructures and the properties of the resulting films. It is found that the present films are dominated by the sp2 sites. However, the films demonstrate a moderate hardness together with a low internal stress. The high hardness of the deposited film originates from the crosslinking of the sp2 clusters by the sp3 sites. The presence of the graphite-like clusters in the film structure may be responsible for the low internal stress. What is more important is that the resulting films show excellent tribological properties with high load capacity and excellent wear resistance in humid atmospheres. The relationship between the microstructure determined by the deposition condition and the film characteristic is discussed in detail.

Key words: magnetron sputtering, graphite-like carbon film, microstructure, performance

中图分类号:  (Amorphous semiconductors, metals, and alloys)

  • 61.43.Dq
62.20.Qp (Friction, tribology, and hardness) 68.55.Ln (Defects and impurities: doping, implantation, distribution, concentration, etc.)