Effect of substrate temperature on microstructure and optical properties of single-phased Ag2O film deposited by using radio-frequency reactive magnetron sputtering method

doi:10.1088/1674-1056/20/5/056102

中国物理B ›› 2011, Vol. 20 ›› Issue (5): 56102-056102.doi: 10.1088/1674-1056/20/5/056102

Effect of substrate temperature on microstructure and optical properties of single-phased Ag₂O film deposited by using radio-frequency reactive magnetron sputtering method

梁艳¹, 马姣民², 郜小勇², 张增院², 陈超², 赵孟珂², 杨仕娥², 谷锦华², 陈永生², 卢景霄²

(1)College of Information Science and Engineering, Henan University of Technology, Zhengzhou 450001, China; (2)Key Laboratory of Material Physics of Ministry of Education, School of Physics and Engineering, Zhengzhou University, Zhengzhou 450052, China

收稿日期:2010-10-14 修回日期:2010-12-09 出版日期:2011-05-15 发布日期:2011-05-15
基金资助:
Project supported by the National Natural Science Foundation of China (Grant No. 60807001), the Foundation of Henan Educational Committee, China (Grant No. 2010A140017) and the National Basic Research Program of China (Grant No. 2011CB201605).

Effect of substrate temperature on microstructure and optical properties of single-phased Ag₂O film deposited by using radio-frequency reactive magnetron sputtering method

Ma Jiao-Min(马姣民)^a), Liang Yan(梁艳)^b), Gao Xiao-Yong(郜小勇)^a)†, Zhang Zeng-Yuan(张增院)^a), Chen Chao(陈超)^a), Zhao Meng-Ke(赵孟珂)^a), Yang Shi-E(杨仕娥)^a), Gu Jin-Hua(谷锦华)^a), Chen Yong-Sheng(陈永生)^a), and Lu Jing-Xiao(卢景霄)^a)

^a Key Laboratory of Material Physics of Ministry of Education, School of Physics and Engineering, Zhengzhou University, Zhengzhou 450052, China; ^b College of Information Science and Engineering, Henan University of Technology, Zhengzhou 450001, China

Received:2010-10-14 Revised:2010-12-09 Online:2011-05-15 Published:2011-05-15
Supported by:
Project supported by the National Natural Science Foundation of China (Grant No. 60807001), the Foundation of Henan Educational Committee, China (Grant No. 2010A140017) and the National Basic Research Program of China (Grant No. 2011CB201605).

摘要/Abstract

摘要： Using a radio-frequency reactive magnetron sputtering technique, a series of the single-phased Ag₂O films are deposited in a mixture of oxygen and argon gas with a flow ratio of 2:3 by changing substrate temperature (T_s). Effects of the T_s on the microstructure and optical properties of the films are investigated by using X-ray diffractometry, scanning electron microscopy and spectrophotometry. The single-phased Ag₂O films deposited at values of T_s below 200 ℃ are (111) preferentially oriented, which may be due to the smallest free energy of the (111) crystalline face. The film crystallization becomes poor as the value of T_s increases from 100 ℃ to 225 ℃. In particular, the Ag₂O film deposited at T_s = 225 ℃ loses the (111) preferential orientation. Correspondingly, the film surface morphology obviously evolves from a uniform and compact surface structure to a loose and gullied surface structure. With the increase of T_s value, the transmissivity and the reflectivity of the films in the transparent region are gradually reduced, while the absorptivity gradually increases, which may be attributed to an evolution of the crystalline structure and the surface morphology of the films.

关键词: Ag₂O film, radio-frequency reactive magnetron sputtering, optical properties, microstructure

Abstract: Using a radio-frequency reactive magnetron sputtering technique, a series of the single-phased Ag₂O films are deposited in a mixture of oxygen and argon gas with a flow ratio of 2:3 by changing substrate temperature (T_s). Effects of the T_s on the microstructure and optical properties of the films are investigated by using X-ray diffractometry, scanning electron microscopy and spectrophotometry. The single-phased Ag₂O films deposited at values of T_s below 200 ℃ are (111) preferentially oriented, which may be due to the smallest free energy of the (111) crystalline face. The film crystallization becomes poor as the value of T_s increases from 100 ℃ to 225 ℃. In particular, the Ag₂O film deposited at T_s = 225 ℃ loses the (111) preferential orientation. Correspondingly, the film surface morphology obviously evolves from a uniform and compact surface structure to a loose and gullied surface structure. With the increase of T_s value, the transmissivity and the reflectivity of the films in the transparent region are gradually reduced, while the absorptivity gradually increases, which may be attributed to an evolution of the crystalline structure and the surface morphology of the films.

Key words: Ag₂O film, radio-frequency reactive magnetron sputtering, optical properties, microstructure

中图分类号: (Semiconductors)

61.82.Fk

61.05.cp (X-ray diffraction) 74.25.Gz (Optical properties) 81.15.Cd (Deposition by sputtering)

马姣民, 梁艳, 郜小勇, 张增院, 陈超, 赵孟珂, 杨仕娥, 谷锦华, 陈永生, 卢景霄. Effect of substrate temperature on microstructure and optical properties of single-phased Ag₂O film deposited by using radio-frequency reactive magnetron sputtering method[J]. 中国物理B, 2011, 20(5): 56102-056102.

Ma Jiao-Min(马姣民), Liang Yan(梁艳), Gao Xiao-Yong(郜小勇), Zhang Zeng-Yuan(张增院), Chen Chao(陈超), Zhao Meng-Ke(赵孟珂), Yang Shi-E(杨仕娥), Gu Jin-Hua(谷锦华), Chen Yong-Sheng(陈永生), and Lu Jing-Xiao(卢景霄). Effect of substrate temperature on microstructure and optical properties of single-phased Ag₂O film deposited by using radio-frequency reactive magnetron sputtering method[J]. Chin. Phys. B, 2011, 20(5): 56102-056102.

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Effect of substrate temperature on microstructure and optical properties of single-phased Ag₂O film deposited by using radio-frequency reactive magnetron sputtering method

Effect of substrate temperature on microstructure and optical properties of single-phased Ag₂O film deposited by using radio-frequency reactive magnetron sputtering method

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