中国物理B ›› 2009, Vol. 18 ›› Issue (10): 4547-4551.doi: 10.1088/1674-1056/18/10/075

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Enhanced field emission characteristics of thin-Au-coated nano-sheet carbon films

顾广瑞1, 伊藤利道2   

  1. (1)Department of Physics, College of Science, Yanbian University, Yanji 133002, China; (2)Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, Osaka 565-0871, Japan
  • 收稿日期:2009-01-30 修回日期:2009-03-23 出版日期:2009-10-20 发布日期:2009-10-20

Enhanced field emission characteristics of thin-Au-coated nano-sheet carbon films

Gu Guang-Rui(顾广瑞)a)† and Ito Toshimichi(伊藤利道)b)   

  1. a Department of Physics, College of Science, Yanbian University, Yanji 133002, China; b Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, Osaka 565-0871, Japan
  • Received:2009-01-30 Revised:2009-03-23 Online:2009-10-20 Published:2009-10-20

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摘要： This paper reports that the nano-sheet carbon films (NSCFs) were fabricated on Si wafer chips with hydrogen--methane gas mixture by means of quartz-tube-type microwave plasma chemical vapour deposition (MWPCVD). In order to further improve the field emission (FE) characteristics, a 5-nm Au film was prepared on the samples by using electron beam evaporation. The FE properties were obviously improved due to depositing Au thin film on NSCFs. The FE current density at a macroscopic electric field, E, of 9~V/μ m was increased from 12.4~mA/cm2 to 27.2~mA/cm2 and the threshold field was decreased from 2.6~V/μ m to 2.0~V/μ m for Au-coated carbon films. A modified F-N model considering statistic effects of FE tip structures in the low E region and a space-charge-limited-current effect in the high E region were applied successfully to explain the FE data of the Au-coated NSCF.

Abstract: This paper reports that the nano-sheet carbon films (NSCFs) were fabricated on Si wafer chips with hydrogen--methane gas mixture by means of quartz-tube-type microwave plasma chemical vapour deposition (MWPCVD). In order to further improve the field emission (FE) characteristics, a 5-nm Au film was prepared on the samples by using electron beam evaporation. The FE properties were obviously improved due to depositing Au thin film on NSCFs. The FE current density at a macroscopic electric field, E, of 9 V/μm was increased from 12.4 mA/cm2 to 27.2 mA/cm2 and the threshold field was decreased from 2.6 V/μm to 2.0 V/μm for Au-coated carbon films. A modified F-N model considering statistic effects of FE tip structures in the low E region and a space-charge-limited-current effect in the high E region were applied successfully to explain the FE data of the Au-coated NSCF.

Key words: nano-sheet carbon films, field emission, microwave plasma chemical vapour deposition, space-charge-limited-current

中图分类号:  (Field emission, ionization, evaporation, and desorption)

  • 79.70.+q
73.50.Fq (High-field and nonlinear effects) 73.63.-b (Electronic transport in nanoscale materials and structures) 81.15.Gh (Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.)) 81.16.-c (Methods of micro- and nanofabrication and processing)