中国物理B ›› 2007, Vol. 16 ›› Issue (10): 3029-3035.doi: 10.1088/1009-1963/16/10/035

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Simulation of multilayer Cu/Pd(100) heteroepitaxial growth by pulse laser deposition

吴锋民, 陆杭军, 方允樟, 黄仕华   

  1. Institute of Condensed Matter Physics, Zhejiang Normal University, Jinhua 321004, China
  • 收稿日期:2006-12-12 修回日期:2007-03-16 出版日期:2007-10-08 发布日期:2007-10-08
  • 基金资助:
    Project supported by the State Key Development Program for Basic Research of China (Grant No 2006CB708612) and Natural Science Foundation for Young Scientists of Zhejiang Province, China (Grant No RC02069).

Simulation of multilayer Cu/Pd(100) heteroepitaxial growth by pulse laser deposition

Wu Feng-Min(吴锋民)† , Lu Hang-Jun(陆杭军), Fang Yun-Zhang(方允樟), and Huang Shi-Hua(黄仕华)   

  1. Institute of Condensed Matter Physics, Zhejiang Normal University, Jinhua 321004, China
  • Received:2006-12-12 Revised:2007-03-16 Online:2007-10-08 Published:2007-10-08
  • Supported by:
    Project supported by the State Key Development Program for Basic Research of China (Grant No 2006CB708612) and Natural Science Foundation for Young Scientists of Zhejiang Province, China (Grant No RC02069).

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摘要： The heteroepitaxial growth of multilayer Cu/Pd(100) thin film via pulse laser deposition (PLD) at room temperature is simulated by using kinetic Monte Carlo (KMC) method with realistic physical parameters. The effects of mass transport between interlayers, edge diffusion of adatoms along the islands and instantaneous deposition are considered in the simulation model. Emphasis is placed on revealing the details of multilayer Cu/Pd(100) thin film growth and estimating the Ehrlich--Schwoebel (ES) barrier. It is shown that the instantaneous deposition in the PLD growth gives rise to the layer-by-layer growth mode, persisting up to about 9 monolayers (ML) of Cu/Pd(100). The ES barriers of $0.08\pm0.01$\,eV is estimated by comparing the KMC simulation results with the real scanning tunnelling microscopy (STM) measurements.

关键词: heteroepitaxy, pulse laser deposition, Ehrlich--Schwoebel (ES) barrier, kinetic Monte Carlo simulation

Abstract: The heteroepitaxial growth of multilayer Cu/Pd(100) thin film via pulse laser deposition (PLD) at room temperature is simulated by using kinetic Monte Carlo (KMC) method with realistic physical parameters. The effects of mass transport between interlayers, edge diffusion of adatoms along the islands and instantaneous deposition are considered in the simulation model. Emphasis is placed on revealing the details of multilayer Cu/Pd(100) thin film growth and estimating the Ehrlich--Schwoebel (ES) barrier. It is shown that the instantaneous deposition in the PLD growth gives rise to the layer-by-layer growth mode, persisting up to about 9 monolayers (ML) of Cu/Pd(100). The ES barriers of $0.08\pm0.01$ eV is estimated by comparing the KMC simulation results with the real scanning tunnelling microscopy (STM) measurements.

Key words: heteroepitaxy, pulse laser deposition, Ehrlich--Schwoebel (ES) barrier, kinetic Monte Carlo simulation

中图分类号:  (Multilayers)

  • 68.65.Ac
68.35.Fx (Diffusion; interface formation) 68.55.A- (Nucleation and growth) 81.15.Fg (Pulsed laser ablation deposition)