中国物理B ›› 2006, Vol. 15 ›› Issue (10): 2422-2426.doi: 10.1088/1009-1963/15/10/039

• • 上一篇    下一篇

A bistable, self-latching inverter by the monolithic integration of resonant tunnelling diode and high electron mobility transistor

杨富华1, 马 龙2, 王良臣2, 黄应龙3, 张 杨4   

  1. (1)Engineering Research Center for Semiconductor Integrated Technology,Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;National Laboratory for Superlattices and Microstructures, Institute of Semiconductors,Chinese Academy of; (2)Engineering Research Center for Semiconductor Integrated Technology,Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China; (3)National Laboratory for Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China; (4)Novel Semiconductor Materials Laboratory, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
  • 收稿日期:2006-03-15 修回日期:2006-04-07 出版日期:2006-10-20 发布日期:2006-10-20
  • 基金资助:
    Project supported by the National High Technology Research and Development Program of China (Grant No 2003AA302750).

A bistable, self-latching inverter by the monolithic integration of resonant tunnelling diode and high electron mobility transistor

Ma Long(马龙)a)†, Huang Ying-Long(黄应龙)b), Zhang Yang(张杨)c), Yang Fu-Hua(杨富华)a)b), and Wang Liang-Chen(王良臣)a)   

  1. a Engineering Research Center for Semiconductor Integrated Technology, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China; b National Laboratory for Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China; c Novel Semiconductor Materials Laboratory, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
  • Received:2006-03-15 Revised:2006-04-07 Online:2006-10-20 Published:2006-10-20
  • Supported by:
    Project supported by the National High Technology Research and Development Program of China (Grant No 2003AA302750).

摘要: This paper reports that the structures of AlGaAs/InGaAs high electron mobility transistor (HEMT) and AlAs/GaAs resonant tunnelling diode (RTD) are epitaxially grown by molecular beam epitaxy (MBE) in turn on a GaAs substrate. An Al0.24Ga0.76As chair barrier layer, which is grown adjacent to the top AlAs barrier, helps to reduce the valley current of RTD. The peak-to-valley current ratio of fabricated RTD is 4.8 and the transconductance for the 1-μm gate HEMT is 125mS/mm. A static inverter which consists of two RTDs and a HEMT is designed and fabricated. Unlike a conventional CMOS inverter, the novel inverter exhibits self-latching property.

关键词: resonant tunnelling diode (RTD), high electron mobility transistor (HEMT), molecular beam epitaxy (MBE), bistability, self-latching

Abstract: This paper reports that the structures of AlGaAs/InGaAs high electron mobility transistor (HEMT) and AlAs/GaAs resonant tunnelling diode (RTD) are epitaxially grown by molecular beam epitaxy (MBE) in turn on a GaAs substrate. An Al0.24Ga0.76As chair barrier layer, which is grown adjacent to the top AlAs barrier, helps to reduce the valley current of RTD. The peak-to-valley current ratio of fabricated RTD is 4.8 and the transconductance for the 1-μm gate HEMT is 125mS/mm. A static inverter which consists of two RTDs and a HEMT is designed and fabricated. Unlike a conventional CMOS inverter, the novel inverter exhibits self-latching property.

Key words: resonant tunnelling diode (RTD), high electron mobility transistor (HEMT), molecular beam epitaxy (MBE), bistability, self-latching

中图分类号:  (Field effect devices)

  • 85.30.Tv
84.30.Sk (Pulse and digital circuits) 85.30.Kk (Junction diodes) 85.30.Mn (Junction breakdown and tunneling devices (including resonance tunneling devices)) 85.40.Sz (Deposition technology)