中国物理B ›› 2006, Vol. 15 ›› Issue (10): 2422-2426.doi: 10.1088/1009-1963/15/10/039
杨富华1, 马 龙2, 王良臣2, 黄应龙3, 张 杨4
Ma Long(马龙)a)†, Huang Ying-Long(黄应龙)b), Zhang Yang(张杨)c), Yang Fu-Hua(杨富华)a)b), and Wang Liang-Chen(王良臣)a)
摘要: This paper reports that the structures of AlGaAs/InGaAs high electron mobility transistor (HEMT) and AlAs/GaAs resonant tunnelling diode (RTD) are epitaxially grown by molecular beam epitaxy (MBE) in turn on a GaAs substrate. An Al0.24Ga0.76As chair barrier layer, which is grown adjacent to the top AlAs barrier, helps to reduce the valley current of RTD. The peak-to-valley current ratio of fabricated RTD is 4.8 and the transconductance for the 1-μm gate HEMT is 125mS/mm. A static inverter which consists of two RTDs and a HEMT is designed and fabricated. Unlike a conventional CMOS inverter, the novel inverter exhibits self-latching property.
中图分类号: (Field effect devices)