中国物理B ›› 2002, Vol. 11 ›› Issue (6): 568-571.doi: 10.1088/1009-1963/11/6/309

• ATOMIC AND MOLECULAR PHYSICS • 上一篇    下一篇

Formation of the XeI excimer sustained by dielectric barrier discharge in Xe/I2 at low pressure

张连水, 赵晓辉, 韩理   

  1. College of Physics Science and Technology, Hebei University, Baoding 071002, China
  • 收稿日期:2001-07-04 修回日期:2002-01-27 出版日期:2005-06-12 发布日期:2005-06-12
  • 基金资助:
    Project supported by the National Natural Science Foundation of Hebei Province, China (Grant No 197059).

Formation of the XeI excimer sustained by dielectric barrier discharge in Xe/I2 at low pressure

Zhang Lian-Shui (张连水), Zhao Xiao-Hui (赵晓辉), Han Li (韩理)   

  1. College of Physics Science and Technology, Hebei University, Baoding 071002, China
  • Received:2001-07-04 Revised:2002-01-27 Online:2005-06-12 Published:2005-06-12
  • Supported by:
    Project supported by the National Natural Science Foundation of Hebei Province, China (Grant No 197059).

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摘要： Dielectric barrier discharge is used to study the mechanism of XeI excimer formation in the mixture of Xe and I2 at low pressures (<1330 Pa). Fluorescence emission in the spectral region of 200－260 nm is examined. We report on the characteristics of the 253 nm emission intensity which varied with different total pressure. The results indicate that under the present experimental conditions, electron impact is the major reaction producing the excimer XeI(B), interpreted as Xe++I2-→XeI(B)+ I*, then radiating 253 nm fluorescence from transition B→X. The 253 nm emission increases with the total gas pressure up to a maximum value at a pressure of about 540 Pa, then decreases as the gas pressure is further increased. The 206 nm emission is determined by I* from ionic recombination between Xe+ and I2-. This result differs from previous works under other experimental conditions.

Abstract: Dielectric barrier discharge is used to study the mechanism of XeI excimer formation in the mixture of Xe and I2 at low pressures (<1330 Pa). Fluorescence emission in the spectral region of 200－260 nm is examined. We report on the characteristics of the 253 nm emission intensity which varied with different total pressure. The results indicate that under the present experimental conditions, electron impact is the major reaction producing the excimer XeI(B), interpreted as Xe++I2-→XeI(B)+ I*, then radiating 253 nm fluorescence from transition B→X. The 253 nm emission increases with the total gas pressure up to a maximum value at a pressure of about 540 Pa, then decreases as the gas pressure is further increased. The 206 nm emission is determined by I* from ionic recombination between Xe+ and I2-. This result differs from previous works under other experimental conditions.

Key words: Dielectric barrier discharge plasma, XeI excimer, fluorescence emission spectrum

中图分类号:  (Fluorescence and phosphorescence spectra)

  • 33.50.Dq
33.70.Fd (Absolute and relative line and band intensities) 34.80.Gs (Molecular excitation and ionization) 33.20.Lg (Ultraviolet spectra) 82.30.Cf (Atom and radical reactions; chain reactions; molecule-molecule reactions) 82.20.Kh (Potential energy surfaces for chemical reactions)