中国物理B ›› 1994, Vol. 3 ›› Issue (9): 682-689.doi: 10.1088/1004-423X/3/9/005
宁兆元1, 吴雪梅1, 陈俊芳2, 程绍玉2, 任兆杏2, 张束清2
CHEN JUN-FANG (陈俊芳)a, CHENG SHAO-YU (程绍玉)a, REN ZHAO-XING (任兆杏)a, ZHANG SU-QING (张束清)a, NING ZHAO-YUAN (宁兆元)b, WU XUE-MEI (吴雪梅)b
摘要: In this paper, the effect of temperature on the composition and structure of the Si3N4 thin film is investigated. X-ray diffraction pattern and transmission electron microscope (TEM) analyses show that the Si3N4 film undergoes the transition from amorphous to crystalline phase with increasing deposition temperature. Infra-red qualitative analysis shows that the content of hydrogen decreases with increasing deposition temperature.The stoichiometric of Si3N4 is investigated by X-ray photoelectron spectroscopy or electron spectroscopy for chemical analysis.
中图分类号: (Composition and phase identification)