Optimization of laser focused atomic deposition by channeling

doi:10.1088/1674-1056/ab631c

中国物理B ›› 2020, Vol. 29 ›› Issue (2): 20601-020601.doi: 10.1088/1674-1056/ab631c

• SPECIAL TOPIC—Recent advances in thermoelectric materials and devices • 上一篇下一篇

Optimization of laser focused atomic deposition by channeling

Jie Chen(陈杰), Jie Liu(刘杰), Li Zhu(朱立), Xiao Deng(邓晓), Xinbin Cheng(陈鑫彬), Tongbao Li(李同保)

School of Physics Science and Engineering, Tongji University, Shanghai 200092, China

收稿日期:2019-09-20 修回日期:2019-12-10 出版日期:2020-02-05 发布日期:2020-02-05
通讯作者: Xiao Deng E-mail:1110490dengxiao@tongji.edu.cn
基金资助:
Project supported by the National Key Research and Development Program of China (Grant No. 2016YFA0200902), Science and Technology Commission of Shanghai Municipality, China (Grant No. 17JC1400801), and Young Scientists Fund of the National Natural Science Foundation of China (Grant No. 51705369).

Optimization of laser focused atomic deposition by channeling

Jie Chen(陈杰), Jie Liu(刘杰), Li Zhu(朱立), Xiao Deng(邓晓), Xinbin Cheng(陈鑫彬), Tongbao Li(李同保)

School of Physics Science and Engineering, Tongji University, Shanghai 200092, China

Received:2019-09-20 Revised:2019-12-10 Online:2020-02-05 Published:2020-02-05
Contact: Xiao Deng E-mail:1110490dengxiao@tongji.edu.cn
Supported by:
Project supported by the National Key Research and Development Program of China (Grant No. 2016YFA0200902), Science and Technology Commission of Shanghai Municipality, China (Grant No. 17JC1400801), and Young Scientists Fund of the National Natural Science Foundation of China (Grant No. 51705369).

摘要/Abstract

摘要： Laser focused atomic deposition is a unique and effective way to fabricate highly accurate pitch standards in nanometrology. However, the stability and repeatability of the atom lithography fabrication process remains a challenging problem for massive production. Based on the atom-light interaction theory, channeling is utilized to improve the stability and repeatability. From the comparison of three kinds of atom-light interaction models, the optimal parameters for channeling are obtained based on simulation. According to the experimental observations, the peak to valley height of Cr nano-gratings keeps stable when the cutting proportion changes from 15% to 50%, which means that the channeling shows up under this condition. The channeling proves to be an effective method to optimize the stability and repeatability of laser focused Cr atomic deposition.

关键词: laser focused atomic deposition, nano-grating, length transition standards, channeling

Abstract: Laser focused atomic deposition is a unique and effective way to fabricate highly accurate pitch standards in nanometrology. However, the stability and repeatability of the atom lithography fabrication process remains a challenging problem for massive production. Based on the atom-light interaction theory, channeling is utilized to improve the stability and repeatability. From the comparison of three kinds of atom-light interaction models, the optimal parameters for channeling are obtained based on simulation. According to the experimental observations, the peak to valley height of Cr nano-gratings keeps stable when the cutting proportion changes from 15% to 50%, which means that the channeling shows up under this condition. The channeling proves to be an effective method to optimize the stability and repeatability of laser focused Cr atomic deposition.

Key words: laser focused atomic deposition, nano-grating, length transition standards, channeling

中图分类号: (Standards and calibration)

06.20.fb

42.50.Wk (Mechanical effects of light on material media, microstructures and particles) 81.16.Nd (Micro- and nanolithography)

陈杰, 刘杰, 朱立, 邓晓, 陈鑫彬, 李同保. Optimization of laser focused atomic deposition by channeling[J]. 中国物理B, 2020, 29(2): 20601-020601.

Jie Chen(陈杰), Jie Liu(刘杰), Li Zhu(朱立), Xiao Deng(邓晓), Xinbin Cheng(陈鑫彬), Tongbao Li(李同保). Optimization of laser focused atomic deposition by channeling[J]. Chin. Phys. B, 2020, 29(2): 20601-020601.

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Optimization of laser focused atomic deposition by channeling

Optimization of laser focused atomic deposition by channeling

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