中国物理B ›› 2020, Vol. 29 ›› Issue (2): 20601-020601.doi: 10.1088/1674-1056/ab631c
• SPECIAL TOPIC—Recent advances in thermoelectric materials and devices • 上一篇 下一篇
Jie Chen(陈杰), Jie Liu(刘杰), Li Zhu(朱立), Xiao Deng(邓晓), Xinbin Cheng(陈鑫彬), Tongbao Li(李同保)
Jie Chen(陈杰), Jie Liu(刘杰), Li Zhu(朱立), Xiao Deng(邓晓), Xinbin Cheng(陈鑫彬), Tongbao Li(李同保)
摘要: Laser focused atomic deposition is a unique and effective way to fabricate highly accurate pitch standards in nanometrology. However, the stability and repeatability of the atom lithography fabrication process remains a challenging problem for massive production. Based on the atom-light interaction theory, channeling is utilized to improve the stability and repeatability. From the comparison of three kinds of atom-light interaction models, the optimal parameters for channeling are obtained based on simulation. According to the experimental observations, the peak to valley height of Cr nano-gratings keeps stable when the cutting proportion changes from 15% to 50%, which means that the channeling shows up under this condition. The channeling proves to be an effective method to optimize the stability and repeatability of laser focused Cr atomic deposition.
中图分类号: (Standards and calibration)