中国物理B ›› 2018, Vol. 27 ›› Issue (3): 37804-037804.doi: 10.1088/1674-1056/27/3/037804

• CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES • 上一篇    下一篇

High mobility ultrathin ZnO p-n homojunction modulated by Zn0.85Mg0.15O quantum barriers

Jing-Jing Yang(杨景景), Qing-Qing Fang(方庆清), Wen-Han Du(杜文汉), Ke-Ke Zhang, Da-Shun Dong(董大舜)   

  1. 1 School of Physics and Materials Science, Anhui University, Hefei 230601, China;
    2 Changzhou Institute of Technology, Changzhou 213002, China;
    3 School of Materials Science and Engineering, Nanyang Technological University, Singapore
  • 收稿日期:2017-10-15 修回日期:2017-12-22 出版日期:2018-03-05 发布日期:2018-03-05
  • 通讯作者: Qing-Qing Fang, Wen-Han Du E-mail:physfangqq@126.com;duwenhan@ntu.edu.sg
  • 基金资助:

    Project supported by the National Natural Science Foundation of China (Grant Nos. 61540071 and 11705016), Project of Natural Science Research of Higher Education in Jiangsu Province, China (Grant Nos. 17KJB510001 and 17KJB140002), Changzhou Sci&Tech Program, China (Grant No. CJ20160026), and Changzhou Institute of Technology Science Foundation, China (Grant No. YN1408).

High mobility ultrathin ZnO p-n homojunction modulated by Zn0.85Mg0.15O quantum barriers

Jing-Jing Yang(杨景景)1,2, Qing-Qing Fang(方庆清)1, Wen-Han Du(杜文汉)2,3, Ke-Ke Zhang3, Da-Shun Dong(董大舜)1   

  1. 1 School of Physics and Materials Science, Anhui University, Hefei 230601, China;
    2 Changzhou Institute of Technology, Changzhou 213002, China;
    3 School of Materials Science and Engineering, Nanyang Technological University, Singapore
  • Received:2017-10-15 Revised:2017-12-22 Online:2018-03-05 Published:2018-03-05
  • Contact: Qing-Qing Fang, Wen-Han Du E-mail:physfangqq@126.com;duwenhan@ntu.edu.sg
  • Supported by:

    Project supported by the National Natural Science Foundation of China (Grant Nos. 61540071 and 11705016), Project of Natural Science Research of Higher Education in Jiangsu Province, China (Grant Nos. 17KJB510001 and 17KJB140002), Changzhou Sci&Tech Program, China (Grant No. CJ20160026), and Changzhou Institute of Technology Science Foundation, China (Grant No. YN1408).

摘要:

The adding of ZnMgO asymmetric double barriers (ADB) in p-ZnO:(Li, N)/n-ZnO homojunction affects the p-n junction device performance prominently. Two different homojunctions are fabricated on Si (100) substrates by pulsed laser deposition; one is the traditional p-ZnO:(Li, N)/n-ZnO homojunction with different thicknesses named as S1 (250 nm) and S2 (500 nm), the other is the one with ADB embedded in the n-layer named as Q (265 nm). From the photoluminescence spectra, defect luminescence present in the S-series devices is effectively limited in the Q device. The current-voltage curve of the Q device shows Zener-diode rectification property because the two-dimensional electron gas tunnels through the narrow ZnMgO barrier under a reverse bias, thus decreasing the working p-n homojunction thickness from 500 nm to 265 nm. The ADB-modified homojunction shows higher carrier mobility in the Q device. The electroluminescence of the ZnO homojunction is improved in Q compared to S2, because the holes in p-type ZnO (Li, N) can cross the wide ZnMgO barrier under a forward bias voltage into the ZnO quantum well. Therefore, electron-hole recombination occurs in the narrow bandgap of n-type ZnO, creating an ultraviolet light-emitting diode using the ZnO homojunction.

关键词: ZnO p-n homojunction, light-emitting diodes, ZnMgO asymmetric double barriers

Abstract:

The adding of ZnMgO asymmetric double barriers (ADB) in p-ZnO:(Li, N)/n-ZnO homojunction affects the p-n junction device performance prominently. Two different homojunctions are fabricated on Si (100) substrates by pulsed laser deposition; one is the traditional p-ZnO:(Li, N)/n-ZnO homojunction with different thicknesses named as S1 (250 nm) and S2 (500 nm), the other is the one with ADB embedded in the n-layer named as Q (265 nm). From the photoluminescence spectra, defect luminescence present in the S-series devices is effectively limited in the Q device. The current-voltage curve of the Q device shows Zener-diode rectification property because the two-dimensional electron gas tunnels through the narrow ZnMgO barrier under a reverse bias, thus decreasing the working p-n homojunction thickness from 500 nm to 265 nm. The ADB-modified homojunction shows higher carrier mobility in the Q device. The electroluminescence of the ZnO homojunction is improved in Q compared to S2, because the holes in p-type ZnO (Li, N) can cross the wide ZnMgO barrier under a forward bias voltage into the ZnO quantum well. Therefore, electron-hole recombination occurs in the narrow bandgap of n-type ZnO, creating an ultraviolet light-emitting diode using the ZnO homojunction.

Key words: ZnO p-n homojunction, light-emitting diodes, ZnMgO asymmetric double barriers

中图分类号:  (Quantum wells)

  • 78.67.De
73.21.Fg (Quantum wells) 68.35.bg (Semiconductors) 81.15.Fg (Pulsed laser ablation deposition)