中国物理B ›› 2017, Vol. 26 ›› Issue (7): 78501-078501.doi: 10.1088/1674-1056/26/7/078501

• INTERDISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY • 上一篇    下一篇

Bridge-free fabrication process for Al/AlOx/Al Josephson junctions

Ke Zhang(张珂), Meng-Meng Li(李蒙蒙), Qiang Liu(刘强), Hai-Feng Yu(于海峰), Yang Yu(于扬)   

  1. 1 National Laboratory of Solid State Microstructures, School of Physics, Nanjing University, Nanjing 210093, China;
    2 Synergetic Innovation Center of Quantum Information & Quantum Physics, University of Science and Technology of China, Hefei 230026, China
  • 收稿日期:2017-03-07 修回日期:2017-04-05 出版日期:2017-07-05 发布日期:2017-07-05
  • 通讯作者: Hai-Feng Yu E-mail:hfyu@nju.edu.cn
  • 基金资助:

    Project supported by the National Key Research and Development Program of China (Grant No.2016YFA0301802) and the National Natural Science Foundation of China (Grant Nos.11474152,91321310,11274156,11504165,and 61521001).

Bridge-free fabrication process for Al/AlOx/Al Josephson junctions

Ke Zhang(张珂)1, Meng-Meng Li(李蒙蒙)1, Qiang Liu(刘强)1, Hai-Feng Yu(于海峰)1,2, Yang Yu(于扬)1,2   

  1. 1 National Laboratory of Solid State Microstructures, School of Physics, Nanjing University, Nanjing 210093, China;
    2 Synergetic Innovation Center of Quantum Information & Quantum Physics, University of Science and Technology of China, Hefei 230026, China
  • Received:2017-03-07 Revised:2017-04-05 Online:2017-07-05 Published:2017-07-05
  • Contact: Hai-Feng Yu E-mail:hfyu@nju.edu.cn
  • Supported by:

    Project supported by the National Key Research and Development Program of China (Grant No.2016YFA0301802) and the National Natural Science Foundation of China (Grant Nos.11474152,91321310,11274156,11504165,and 61521001).

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摘要：

We fabricate different-sized Al/AlOx/Al Josephson junctions by using a simple bridge-free technique, in which only single-layer E-beam resist polymethyl methacrylate (PMMA) is exposed at low accelerate voltage (below 30 kV) and the size of junction can be varied in a large range. Compared with the bridge technique, this fabrication process is very robust because it can avoid collapsing the bridge during fabrication. This makes the bridge-free technique more popular to meet different requirements for Josephson junction devices especially for superconducting quantum bits.

关键词: Josephson junction, bridge-free technique, e-beam lithography, superconducting qubit

Abstract:

We fabricate different-sized Al/AlOx/Al Josephson junctions by using a simple bridge-free technique, in which only single-layer E-beam resist polymethyl methacrylate (PMMA) is exposed at low accelerate voltage (below 30 kV) and the size of junction can be varied in a large range. Compared with the bridge technique, this fabrication process is very robust because it can avoid collapsing the bridge during fabrication. This makes the bridge-free technique more popular to meet different requirements for Josephson junction devices especially for superconducting quantum bits.

Key words: Josephson junction, bridge-free technique, e-beam lithography, superconducting qubit

中图分类号:  (Josephson devices)

  • 85.25.Cp
03.67.Lx (Quantum computation architectures and implementations) 85.25.Am (Superconducting device characterization, design, and modeling)