Technology demonstration of a novel poly-Si nanowire thin film transistor

doi:10.1088/1674-1056/25/11/118504

中国物理B ›› 2016, Vol. 25 ›› Issue (11): 118504-118504.doi: 10.1088/1674-1056/25/11/118504

• INTERDISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY • 上一篇下一篇

Technology demonstration of a novel poly-Si nanowire thin film transistor

Libin Liu(刘立滨), Renrong Liang(梁仁荣), Bolin Shan(单柏霖), Jun Xu(许军), Jing Wang(王敬)

Tsinghua National Laboratory for Information Science and Technology, Institute of Microelectronics, Tsinghua University, Beijing 100084, China

收稿日期:2016-05-15 修回日期:2016-07-04 出版日期:2016-11-05 发布日期:2016-11-05
通讯作者: Renrong Liang E-mail:liangrr@mail.tsinghua.edu.cn
基金资助:
Project supported by the National Key Research and Development Program of China (Grant Nos. 2016YFA0302300 and 2016YFA0200404), the National Natural Science Foundation of China (Grant No. 61306105), the National Science and Technology Major Project of China (Grant No. 2011ZX02708-002), the Tsinghua University Initiative Scientific Research Program, China and the Tsinghua National Laboratory for Information Science and Technology (TNList) Cross-discipline Foundation, China.

Technology demonstration of a novel poly-Si nanowire thin film transistor

Libin Liu(刘立滨), Renrong Liang(梁仁荣), Bolin Shan(单柏霖), Jun Xu(许军), Jing Wang(王敬)

Tsinghua National Laboratory for Information Science and Technology, Institute of Microelectronics, Tsinghua University, Beijing 100084, China

Received:2016-05-15 Revised:2016-07-04 Online:2016-11-05 Published:2016-11-05
Contact: Renrong Liang E-mail:liangrr@mail.tsinghua.edu.cn
Supported by:
Project supported by the National Key Research and Development Program of China (Grant Nos. 2016YFA0302300 and 2016YFA0200404), the National Natural Science Foundation of China (Grant No. 61306105), the National Science and Technology Major Project of China (Grant No. 2011ZX02708-002), the Tsinghua University Initiative Scientific Research Program, China and the Tsinghua National Laboratory for Information Science and Technology (TNList) Cross-discipline Foundation, China.

摘要/Abstract

摘要：

A simple process flow method for the fabrication of poly-Si nanowire thin film transistors (NW-TFTs) without advanced lithographic tools is introduced in this paper. The cross section of the nanowire channel was manipulated to have a parallelogram shape by combining a two-step etching process and a spacer formation technique. The electrical and temperature characteristics of the developed NW-TFTs are measured in detail and compared with those of conventional planar TFTs (used as a control). The as-demonstrated NW-TFT exhibits a small subthreshold swing (191 mV/dec), a high ON/OFF ratio (8.5×10⁷), a low threshold voltage (1.12 V), a decreased OFF-state current, and a low drain-induced-barrier lowering value (70.11 mV/V). The effective trap densities both at the interface and grain boundaries are also significantly reduced in the NW-TFT. The results show that all improvements of the NW-TFT originate from the enhanced gate controllability of the multi-gate over the channel.

关键词: thin film transistor, poly-Si, nanowire, spacer technique

Abstract:

Key words: thin film transistor, poly-Si, nanowire, spacer technique

中图分类号: (Field effect devices)

85.30.Tv

85.35.-p (Nanoelectronic devices) 85.30.-z (Semiconductor devices)

刘立滨, 梁仁荣, 单柏霖, 许军, 王敬. Technology demonstration of a novel poly-Si nanowire thin film transistor[J]. 中国物理B, 2016, 25(11): 118504-118504.

Libin Liu(刘立滨), Renrong Liang(梁仁荣), Bolin Shan(单柏霖), Jun Xu(许军), Jing Wang(王敬). Technology demonstration of a novel poly-Si nanowire thin film transistor[J]. Chin. Phys. B, 2016, 25(11): 118504-118504.

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Technology demonstration of a novel poly-Si nanowire thin film transistor

Technology demonstration of a novel poly-Si nanowire thin film transistor

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