Fabrication and measurement of traceable pitch standard with a big area at trans-scale

doi:10.1088/1674-1056/23/9/090601

中国物理B ›› 2014, Vol. 23 ›› Issue (9): 90601-090601.doi: 10.1088/1674-1056/23/9/090601

Fabrication and measurement of traceable pitch standard with a big area at trans-scale

邓晓^a, 李同保^a, 雷李华^{a b}, 马艳^a, 马蕊^a, 翁浚婧^{a b}, 李源^b

a School of Physics Science and Engineering, Tongji University, Shanghai 200092, China;
b Shanghai Institute of Measurement and Testing Technology, National Center of Measurement and Testing for East China, National Center of Testing Technology, Shanghai 201203, China

收稿日期:2014-04-01 修回日期:2014-05-13 出版日期:2014-09-15 发布日期:2014-09-15
基金资助:
Project supported by the Major Research Plan of the National Natural Science Foundation of China (Grant No. 91123022) and the Young Scientists Fund of the National Natural Science Foundation of China (Grant No. 10804084).

Fabrication and measurement of traceable pitch standard with a big area at trans-scale

Deng Xiao (邓晓)^a, Li Tong-Bao (李同保)^a, Lei Li-Hua (雷李华)^{a b}, Ma Yan (马艳)^a, Ma Rui (马蕊)^a, Weng Jun-Jing (翁浚婧)^{a b}, Li Yuan (李源)^b

a School of Physics Science and Engineering, Tongji University, Shanghai 200092, China;
b Shanghai Institute of Measurement and Testing Technology, National Center of Measurement and Testing for East China, National Center of Testing Technology, Shanghai 201203, China

Received:2014-04-01 Revised:2014-05-13 Online:2014-09-15 Published:2014-09-15
Contact: Li Tong-Bao E-mail:tbli@tongji.edu.cn
Supported by:
Project supported by the Major Research Plan of the National Natural Science Foundation of China (Grant No. 91123022) and the Young Scientists Fund of the National Natural Science Foundation of China (Grant No. 10804084).

摘要/Abstract

摘要： Atom lithography with chromium can be utilized to fabricate a pitch standard,which is directly traceable to the wavelength of the laser standing waves. The result of a calibrated commercial AFM measurement demonstrates that the pitch standard is (212.8± 0.1) nm with a peak-to-valley-height (PTVH) better than 20 nm. The measurement results show the high period accuracy of traceability with the standing laser wavelength (λ/2=212.78 nm). The Cr nano-grating covers a 1000 μm×500 μm area, with a PTVH better than 10 nm. The feature width broadening of the Cr nanostructure has been experimentally observed along the direction of the standing waves. The PTVH along the Gaussian laser direction is similar to a Gaussian distribution. Highly uniform periodic nanostructures with a big area at the millimeter scale, and the surface growth uniformity of the Cr nano-grating, show its great potential in the application of a traceable pitch standard at trans-scales.

关键词: atom lithography, nano-scale metrology standard, traceability

Abstract: Atom lithography with chromium can be utilized to fabricate a pitch standard,which is directly traceable to the wavelength of the laser standing waves. The result of a calibrated commercial AFM measurement demonstrates that the pitch standard is (212.8± 0.1) nm with a peak-to-valley-height (PTVH) better than 20 nm. The measurement results show the high period accuracy of traceability with the standing laser wavelength (λ/2=212.78 nm). The Cr nano-grating covers a 1000 μm×500 μm area, with a PTVH better than 10 nm. The feature width broadening of the Cr nanostructure has been experimentally observed along the direction of the standing waves. The PTVH along the Gaussian laser direction is similar to a Gaussian distribution. Highly uniform periodic nanostructures with a big area at the millimeter scale, and the surface growth uniformity of the Cr nano-grating, show its great potential in the application of a traceable pitch standard at trans-scales.

Key words: atom lithography, nano-scale metrology standard, traceability

中图分类号: (Standards and calibration)

06.20.fb

42.50.Wk (Mechanical effects of light on material media, microstructures and particles) 81.16.Nd (Micro- and nanolithography)

邓晓, 李同保, 雷李华, 马艳, 马蕊, 翁浚婧, 李源. Fabrication and measurement of traceable pitch standard with a big area at trans-scale[J]. 中国物理B, 2014, 23(9): 90601-090601.

Deng Xiao (邓晓), Li Tong-Bao (李同保), Lei Li-Hua (雷李华), Ma Yan (马艳), Ma Rui (马蕊), Weng Jun-Jing (翁浚婧), Li Yuan (李源). Fabrication and measurement of traceable pitch standard with a big area at trans-scale[J]. Chin. Phys. B, 2014, 23(9): 90601-090601.

参考文献 20

[1]	Li T B 2005 Shanghai Measurement and Testing 32 8 (in Chinese)
[2]	Ekstrom C R, Keith D W and Pritchard D E 1992 Appl. Phys. B 54 369
[3]	McClelland J J and Scheinfein M R 1991 JOSA B 8 1974
[4]	Timp G, Behringer R E, Tennant D M, Cunningham J E, Prentiss M and Berggren K K 1992 Phys. Rev. Lett. 69 1636
[5]	McClelland J J, Scholten R E, Palm E C and Celotta R J 1993 Science 262 877
[6]	Drodofsky U, Stuhler J, Schulze T, Drewsen M, Brezger B, Pfau T and Mlynek J 1997 Appl. Phys. B 65 755
[7]	McGowan R W, Giltner D M and Lee S A 1995 Opt. Lett. 20 2535
[8]	Ohmukai R, Urabe S and Watanabe M 2003 Appl. Phys. B 77 415
[9]	Te S E, Smeets B, van der Stam K M R, Herfst R W, van der Straten P, Beijerinck H C W and van Leeuwen K A H 2004 Appl. Phys. Lett. 85 4493
[10]	Jürgens D, Greiner A, Stützle R, Habenicht A, Te Sligte E and Oberthaler M K 2004 Phys. Rev. Lett. 93 237402
[11]	Zhang W J, Ma Y, Li T B, Zhang P P, Deng X, Chen S and Xiao S W 2013 Chin. Phys. B 22 023701
[12]	Chen S, Ma Y, Zhang P P, Wang J B, Deng X, Xiao S W, Ma R and Li T B 2014 Chin. Phys. B 23 020301
[13]	Ma Y, Zhang B W, Zheng C L, Ma S S, Li F S, Wang Z S and Li T B 2007 Acta Phys. Sin. 56 1365 (in Chinese)
[14]	Gupta R, McClelland J J, Marte P and Celotta R J 1996 Phys. Rev. Lett. 76 4689
[15]	McClelland J J and Celotta R J 2000 Thin Solid Films 367 25
[16]	Lee C J 2000 Phys. Rev. A 61 063604
[17]	Jiao X G, Yin C, Shi C Y and Qian J 2011 Chinese Journal of Lasers 38 0708004 (in Chinese)
[18]	McClelland J J, Anderson W R, Bradley C C, Walkiewicz M and Celotta R J 2003 Journal of Research-National Institute of Standards and Technology 108 99
[19]	Deng X, Ma Y, Zhang P P, Zhang W J, Chen S, Xiao S W and Li T B 2012 Appl. Surf. Sci. 261 464
[20]	Wang J B, Qian J, Yin C, Shi C Y and Lei M 2012 Acta Phys. Sin. 61 190601 (in Chinese)

Fabrication and measurement of traceable pitch standard with a big area at trans-scale

Fabrication and measurement of traceable pitch standard with a big area at trans-scale

PDF (PC)

赞

可视化

摘要/Abstract

引用本文

使用本文

参考文献 20

相关文章 3

Metrics

本文评价

推荐阅读 0

[1]	Fang Wang(王芳), Yushu Shi(施玉书), Wei Li(李伟), Xiao Deng(邓晓), Xinbin Cheng(程鑫彬), Shu Zhang(张树), and Xixi Yu(余茜茜). Characterization of a nano line width reference material based on metrological scanning electron microscope[J]. 中国物理B, 2022, 31(5): 50601-050601.
[2]	陈晟, 马艳, 张萍萍, 王建波, 邓晓, 肖盛炜, 马蕊, 李同保. Analysis of Cr atom focusing deposition properties in the double half Gaussian standing wave field[J]. 中国物理B, 2014, 23(2): 20301-020301.
[3]	张万经, 马艳, 李同保, 张萍萍, 邓晓, 陈晟, 肖盛炜 . Structured mirror array for two-dimensional collimation of a chromium beam in atom lithography[J]. 中国物理B, 2013, 22(2): 23701-023701.